2001
DOI: 10.1016/s1369-8001(00)00174-8
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Electrical characterization of semiconductor materials and devices using scanning probe microscopy

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Cited by 49 publications
(31 citation statements)
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“…For this type of measurements, usually, two different setups are used; conductive atomic force microscope (C-AFM) [1][2][3] and tunneling AFM (TUNA), 4 depending on the range of currents involved. The first is used to measure current in the range of sub-nA to lA, the latter for the range between sub-pA to nA.…”
mentioning
confidence: 99%
“…For this type of measurements, usually, two different setups are used; conductive atomic force microscope (C-AFM) [1][2][3] and tunneling AFM (TUNA), 4 depending on the range of currents involved. The first is used to measure current in the range of sub-nA to lA, the latter for the range between sub-pA to nA.…”
mentioning
confidence: 99%
“…28 Unlike other scanning probe-based techniques, C-AFM enables simultaneous and independent acquisition of topography and current maps of samples at fixed voltage and thus highly and poorly conducting regions can be distinguished. [29][30][31] …”
Section: Preparation Of Pani-zno Nano-composite and Panimentioning
confidence: 99%
“…Such measurements require a more sensitive current amplifier, with a lower noise level, and are sometimes referred to as tunneling AFM (TUNA). Other than the characterization of dielectric films, this method can also be used to map samples of low conductivity, and typically measured currents are in the range of tens of fA-100 pA [12].…”
Section: Conductive Atomic Force Microscopymentioning
confidence: 99%