“…Many techniques, such as electrodeposition [5,6], thermal evaporation [7], sol gel [8], solution growth [9], electron beam evaporation [10], pulsed laser deposition [11], spray pyrolysis [12], activated reactive evaporation [13], chemical vapor deposition [14], molecular beam epitaxy [15], dc and rf magnetron sputtering [16][17][18], have been employed to deposit Cu 2 O thin films onto various types of substrates. Among all the deposition techniques, dc reactive magnetron sputtering is one of the best techniques for depositing the films with high deposition rates at relatively low substrate temperatures.…”