Efficient source polarization optimization for robust optical lithography

Ma, Xu; Gao, Jie; Han, Chunying; Li, Yanqiu; Dong, Lisong; Liu, Lihui

doi:10.1117/12.2045724

Cited by 5 publications

(2 citation statements)

References 15 publications

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“…The suggested solution framework can be further extended by well‐established techniques from both fields of multidisciplinary topology optimization and computational lithography. One extension is to incorporate the recent work by Ma et al , that considers polarization angle of the source as an additional design variable to enable more design freedom in PEC. In addition, various regularization approaches can be applied to control the final mask and source to meet actual manufacturing and utility requirements.…”

Section: Discussion and Future Workmentioning

confidence: 99%

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Topology optimization for optical microlithography with partially coherent illumination

Zhou

Lazarov

Sigmund

2016

Int. J. Numer. Meth. Engng

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SUMMARYThis article revisits a topology optimization design approach for micro-manufacturing and extends it to optical microlithography with partially coherent illumination. The solution is based on a combination of two technologies, the topology optimization and the proximity error correction in micro-/nano-lithography. The key steps include (i) modeling the physical inputs of the fabrication process, including the UV-light illumination source and the mask, as the design variables in optimization and (ii) applying physical filtering and heaviside projection for topology optimization, which correspond to the aerial image formulation and the pattern development processes, respectively. The proposed approach results in an effective source and a binary design mask, which can be sent directly to fabrication without additional post-processing steps for proximity error correction. Meanwhile, the performance of the device is optimized and robust w.r.t. process variations, such as dose / photo-resist variations and lens defocus. A compliant micro-gripper design example is considered to demonstrate the applicability of this approach. CCC Received . . .

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Section: Discussion and Future Workmentioning

confidence: 99%

“…Both approaches require a nonlinear modeling of the EBL process. For OPL, various resolution enhancement techniques have been proposed by modulating the input mask or the illumination source in order to ensure patterns of the best quality. Other methods include utilization of phase‐shift mask and off‐axis illuminations .…”

Section: Introductionmentioning

confidence: 99%

Topology optimization for optical microlithography with partially coherent illumination

Zhou

Lazarov

Sigmund

2016

Int. J. Numer. Meth. Engng

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Friction Mechanism and Characteristics of Reticle Based on Contact Theory

Wang

Chen

et al. 2021

Journal of Tribology

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With the development of integrated circuits, the structure of chips becomes more and more complex, and the processing cost increases accordingly. In order to improve the productivity of lithography, the acceleration of reticle stage should be increased to reduce the positioning time. However, the increase of acceleration will cause the relative slip between reticle and vacuum chuck, which seriously affects the accuracy and product yield of lithography. In order to suppress the slippage, the friction mechanism and characteristics between reticle and chuck are studied in this paper. Firstly, based on KE contact model and MB fractal contact model, the maximum static friction coefficient model between nano-scale surfaces was established. Then, the surface morphology parameters of reticle and chuck adsorption surface was obtained by atomic force microscopy (AFM) scanning. Finally, the maximum static friction force experiments show that the MB model is more suitable for the study of friction mechanism between reticle and vacuum chuck, and the model is more instructive for the suppression of reticle slip.

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Gradient-based joint source polarization mask optimization for optical lithography

Dong

Han

et al. 2015

J. Micro/Nanolith. MEMS MOEMS

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Efficient source polarization optimization for robust optical lithography

Cited by 5 publications

References 15 publications

Topology optimization for optical microlithography with partially coherent illumination

Topology optimization for optical microlithography with partially coherent illumination

Friction Mechanism and Characteristics of Reticle Based on Contact Theory

Gradient-based joint source polarization mask optimization for optical lithography

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