2014
DOI: 10.1116/1.4875955
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Efficient proximity effect correction method based on multivariate adaptive regression splines for grayscale e-beam lithography

Abstract: Grayscale electron beam lithography is an important technique to manufacture three-dimensional (3D) micro- and nano-structures, such as diffractive optical devices and Fresnel lenses. However, the proximity effect due to the scattering of electrons may cause significant error to the desired 3D structure. Conventional proximity correction methods depend on the exposure energy distribution which sometimes is difficult to obtain. In this study, the authors develop a novel proximity effect correction method based … Show more

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Cited by 5 publications
(2 citation statements)
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“…The discs used to build up Stacked Prism Lenses are fabricated using focused UV lithography 33 , for which a UV lens is employed to shape the UV beam and pattern the photoresist, instead of the binary photomask used in conventional UV lithography. The UV lens is fabricated with grayscale e-beam lithography 38 . The negative photoresist, SU-8 2100, The applied photoresist is exposed with focused UV lithography.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The discs used to build up Stacked Prism Lenses are fabricated using focused UV lithography 33 , for which a UV lens is employed to shape the UV beam and pattern the photoresist, instead of the binary photomask used in conventional UV lithography. The UV lens is fabricated with grayscale e-beam lithography 38 . The negative photoresist, SU-8 2100, The applied photoresist is exposed with focused UV lithography.…”
Section: Resultsmentioning
confidence: 99%
“…Lithographic process for the UV lens. The fabrication method for the UV lens is grayscale ebeam lithography 33,38 . The e-beam resist SML 1000 was used as structural material.…”
Section: Methodsmentioning
confidence: 99%