2018
DOI: 10.1149/2.0061809jss
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Efficient Layout Design of Junctionless Transistor Based 6-T SRAM Cell Using SOI Technology

Abstract: In this work novel 6-T SRAM layout has been proposed using Junctionless SOI MOS transistor. The key idea of the proposed structure is to reduce the area consumed by the device with an aim to improve its performance. The junctionless SOI n-and p-MOS transistor exhibits lower off-state current and higher I on to I off ratio when compared to double gate junctionless transistor available in the literature. In the proposed 6-T SRAM cell layout formation, an arrangement of latch circuit was done and later on two n-t… Show more

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Cited by 10 publications
(2 citation statements)
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“…The structure parameters are an oxide (HfO 2 ) with EOT 1 nm, channel doping is 1 × 10 19 cm -3 , length of gate is 20 nm, thickness of silicon is 6 nm. Kumar et al [30] proposed a paper on RF performance of the recessed channel with a transparent gate (Fig. 17).…”
Section: High-k Spacermentioning
confidence: 99%
“…The structure parameters are an oxide (HfO 2 ) with EOT 1 nm, channel doping is 1 × 10 19 cm -3 , length of gate is 20 nm, thickness of silicon is 6 nm. Kumar et al [30] proposed a paper on RF performance of the recessed channel with a transparent gate (Fig. 17).…”
Section: High-k Spacermentioning
confidence: 99%
“…MOSFET is also used for memory applications to store data. 6T SRAM cell using MOSFET was designed to store data that occupies less area in the chip [6]. MOSFETs were also adopted by NASA to detect interplanetary magnetic fields and interplanetary plasma.…”
Section: Introductionmentioning
confidence: 99%