Efficient diffractive optical elements in chalcogenide glass layers fabricated by direct DUV laser writing

Прямий Лазерний Запис Мікрорельєфних Структур В Халькогенідних Склах Лазерним Променевим Записувачем Мастер-Дисків

“…The spatial resolution of the process of creating micro-optical elements using DLW is primarily determined by the spot size of the focused laser beam. This subsequently depends on the wavelength and characteristics of the recording materials, an on the accuracy of the two-coordinate positioning systems used in the recording process [7].…”

“…Unlike conventional high refractive index glasses, chalcogenide glasses can undergo distinct radiation-induced structural modifications, at comparatively low power densities and exposure doses [7]. Chalcogenide glasses have gained extensive interest, not only because of their high refractive index, wide transparent window, and high optical nonlinearity, but also for their rich physicochemical properties, such as phase changing and photopolymerization, upon light exposure [17,18].…”

“…The type of resist depends on both the composition and the selective etching used [8]. To obtain micro-optical elements by direct laser recording, chalcogenide semiconductors of various compositions can be used: As-based glasses (As35S65) and Ge-based glasses for the formation of images in the UV-range (244 nm) [7]; 3D micro-optical elements formed by the photo-structural transformations of germanium silicate by DLW [25]; telluride (PbTe) chalcogenide for the formation of micro-optical elements for the near IR-range [26]. Using DLW with femtosecond pulses of UV-radiation, diffraction gratings were recorded on thin films of As2S3 [17].…”

“…The use of inorganic photoresists can alleviate some of the challenges of transitioning to the nanoscale range. Inorganic photoresists, based on chalcogenide semiconductors, are widely used in the DLW method [7][8][9][10]. Microrelief images on chalcogenide semiconductors can be obtained by various methods of DLW: local evaporation of the absorbing material, a change in the volume of the material in the radiation zone, and photo-structural transformations with subsequent selective chemical etching.…”

Direct Imprint of Optical Functionalities on Free‐Form Chalcogenide Glasses

“…One important aspect of the fabrication of many optical devices is surface pattering with miniaturized functional structures, for example, waveguides, resonators, or diffraction grating. To pattern chalcogenide glasses for device fabrication, direct writing with an electron beam or with a laser has been broadly used . However, beam writing, which is a serial process, has a very low throughput, and is thus suitable for prototyping rather than for scalable fabrication of devices.…”