Effects of U.V. light on the transport properties of a-Si : H films during their growth

Martins, Rodrigo; Carvalho, N.; Fortunato, Elvira; Maçarico, A.; Santos, M.P. dos; Baía, I.; Viera, Márcio; Guimarães, L.

doi:10.1016/0022-3093(87)90335-8

Cited by 13 publications

(1 citation statement)

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“…light 5 ) have been used to improve films' quality for devices application. Nevertheless, little is known 6 ,7, 8 about the correlation between species' reactions, optoelectronic and structural properties presented by these films.…”

Section: (Electron Cyclotron Resonance) Cpm 4 (Controlled Plasmamentioning

confidence: 99%

Plasma Diagnostic of a TCDDC System Using a Quadropole Mass Spectrometer

Vieira

Maçarico²,

Martins

et al. 1989

MRS Proc.

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Species formed during the decomposition of silane-methane-hydrogen mixtures ([SiH4]x:[CH4]y:[H21z), by spatial plasma separation technique using the TCDDC (Two Consecutive Decomposition and Deposition Chambre) systeml, are evaluated by mass spectrometric analysis and related with the structural and electro-optical properties for either amorphous (a-) or microcrystalline (gc-) thin films. Results obtained show that in the plasma region, the main reaction is the direct fragmentation of Sill 4 by electron impact whilst near the growing surface, the main detected species are excited. The kind of species and their intensity depend strongly on the power density (dp), mixture gas ratio (g = CH 4 /SiH 4 +CH 4 ), static electromagnetic (ý,B) fields and r.f. frequency (f), used. Since CH 4 has a threshold decomposition higher than that one of Sil-4 , the species presented at the plasma region are, mainly, methyl, dimethyl and CH 2 -CH 2 graphitic-like chains depending, mostly, on dp and on g. By diluting the mixture in H 2 , we observe the existence of active H 2 species that, for high dp, may lead to a transition from the amorphous to microcrystalline phase, as well as a carbon incorporation in the amorphous tissue as graphitic-like bonds. This allow us to infer the merit of the TCDDC system in producing a-/4ic-thin films that can be applied to photovoltaic and other applications.

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Section: (Electron Cyclotron Resonance) Cpm 4 (Controlled Plasmamentioning

confidence: 99%