1999
DOI: 10.1063/1.123661
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Effects of surface reconstruction on III–V semiconductor interface formation: The role of III/V composition

Abstract: Public reporting burden for the collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing the collection of information. Send comments regarding this burden estimate or any other aspect of this collection of information, including suggestions for reducing this burden, to Washington Headquarters Services, Directorate for Information Operations and R… Show more

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Cited by 40 publications
(22 citation statements)
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“…We have demonstrated elsewhere that the formation of vacancy islands is a direct result of the different compositions of the clean InAs ͑0.5 ML As/0.75 ML In͒ and Sb-terminated surfaces ͑ϳ1.7 ML SbϩAs/1 ML In͒. 15 When depositing 1 ML of In during MEE, one can think of 1/4 ML of this In ''filling in'' the In missing from the original ͑2 ϫ4͒-reconstructed surface, while the other 3/4 ML remains as additional islands on the surface. Terminating this In with Sb, to complete the Sb-rich ͑1ϫ3͒-like reconstruction, leads to the observed 75%/25% bilevel surface morphology.…”
Section: Resultsmentioning
confidence: 99%
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“…We have demonstrated elsewhere that the formation of vacancy islands is a direct result of the different compositions of the clean InAs ͑0.5 ML As/0.75 ML In͒ and Sb-terminated surfaces ͑ϳ1.7 ML SbϩAs/1 ML In͒. 15 When depositing 1 ML of In during MEE, one can think of 1/4 ML of this In ''filling in'' the In missing from the original ͑2 ϫ4͒-reconstructed surface, while the other 3/4 ML remains as additional islands on the surface. Terminating this In with Sb, to complete the Sb-rich ͑1ϫ3͒-like reconstruction, leads to the observed 75%/25% bilevel surface morphology.…”
Section: Resultsmentioning
confidence: 99%
“…The primary limitation to getting a flat surface is depositing the precise amount of In which is needed. 15 We now proceed to examine the second interface-the one between the first AlSb barrier and the InAs or GaSb quantum well material. Three 5-ML-thick AlSb films were grown under different conditions, each starting on a flat, freshly prepared InSb͑As͒ surface made using 1.25 ML of In, as just described.…”
Section: Resultsmentioning
confidence: 99%
“…21 Other samples were grown to examine the growth of AlSb on InAs to determine the factors required to obtain smooth barriers for resonant tunnel diodes. Detailed reports of these and related STM studies by others have already been published, [21][22][23][24][25][26][27] and notably, the growth temperature has been found to be a contributing factor in obtaining smooth AlSb barriers. This report examines the correlation of the growth temperature changes observed by STM and I -V measurements.…”
Section: Methodsmentioning
confidence: 99%
“…A central question for epitaxially grown heterostructures is the formation of the interface, especially for the non-common anion combinations GaSb/InAs or AlSb/InAs [1]. We therefore need to understand the equilibrium configuration and growth kinetics of the surface reconstructions involved to be able to explore different pathways of interface growth.…”
Section: Introductionmentioning
confidence: 99%