2021
DOI: 10.1088/1361-6463/abf44b
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Effects of substrate termination on R on increase under stress in 650 V GaN power devices

Abstract: Buffer related electron trapping and hot electron injection are responsible for R on degradation in devices, but the effects of substrate termination are still uncertain. In this work, both positive and negative substrate bias are applied to investigate the different vertical trapping mechanisms in 650 V gallium nitride (GaN) power devices. R on shows an instant and significant increase under vertical bias stress, and the magnitude of downward buffer electron trapping induce… Show more

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“…The mechanisms on the R on,dynamic degradation can be explained by the following three aspects [90,91]: (1) gate reliability: under off-state high drain stress, the electrons in the gate region will diffuse downward and be captured by the traps at the dielectric/GaN interface and/or in the dielectric of MIS gate. When switching to on-state, the captured electrons could not be released immediately.…”
Section: Reliability Issues In E-mode Hemtsmentioning
confidence: 99%
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“…The mechanisms on the R on,dynamic degradation can be explained by the following three aspects [90,91]: (1) gate reliability: under off-state high drain stress, the electrons in the gate region will diffuse downward and be captured by the traps at the dielectric/GaN interface and/or in the dielectric of MIS gate. When switching to on-state, the captured electrons could not be released immediately.…”
Section: Reliability Issues In E-mode Hemtsmentioning
confidence: 99%
“…When the device switches to on-state, the captured electrons cannot be released immediately, and hence the 2DEG in the access region is still partially depleted, resulting in the increase of R on,dynamic . (3) Buffer trapping/detrapping: under off-state high drain bias, a vertical electric [90,91]. Adapted from [91].…”
Section: Reliability Issues In E-mode Hemtsmentioning
confidence: 99%
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