Effects of substrate on the structure and orientation of ZnO thin film grown by rf-magnetron sputtering

Abstract

Effect of high-energy electron beam irradiation on the properties of ZnO thin films prepared by magnetron sputtering

Investigation of initial growth and very thin () ZnO films by cross-sectional and plan-view transmission electron microscopy

“…From this, we can determine the epitaxial relationship between a-plane ZnO and r-plane Al 2 O 3 as ð1 12 0ÞZnO==ð11 0 2Þ Al 2 O 3 and ½0 0 0 1ZnO==ð1 1 0 1Þ Al 2 O 3 , which was consistent to the relationship determined by RHEED and X-ray diffraction in our previous report [11]. Actually, this epitaxial relationship is frequently observed in the ZnO films grown on rplane sapphire substrates by metalorganic chemical vapor deposition (MOCVD) [24] or rf-magnetron sputtering [25] under the optimized growth conditions.…”

Effects of crystalline quality on the ultraviolet emission and electrical properties of the ZnO films deposited by magnetron sputtering

“…The effects of crystalline quality on the UV emission of ZnO films have been widely investigated, and some controversial results were reported [11][12][13][14]. Kim et al reported that the PL property of ZnO films was improved because the grain size increased with RF power, even if the crystallinity of the ZnO films was degraded due to an increase in the mosaicity of the films [14].…”

“…For example, Jeong et al found that the UV emission was dominating for the ZnO films deposited in pure O 2 ambient and the emission properties of the ZnO film are more dependent on the film stoichiometry than the film crystallinity [12]. It has also been reported that ZnO/GaAs (0 0 1) sample with pure texture structure and small grain sizes had the stronger UV emission than the single ZnO (0 0 0 2) crystal film on GaAs (1 1 1) substrate, indicating that the grain boundaries of the ZnO film play a minor role in UV emission [13]. On the other hand, Kim and coworkers reported that the optical properties of ZnO films were closely related to both grain size and crystallinity, and the ZnO film with the narrowest width of X-ray rocking curve and the lowest channeling minimum yield exhibited the narrowest UV emission peak [14].…”

“…Recently, radio frequency (RF) magnetron sputtering as a fast and low cost approach also has been adopted to deposit ZnO films. During the growth of ZnO thin films, the deposition condition such as substrate, RF power, growth temperature and ambient, have great influence on the crystal quality and properties of ZnO films, and the effects of deposition parameters on the UV emission of the ZnO films have been widely investigated [11][12][13][14]. However, some controversial results have been reported.…”

Growth and characterization of nonpolar a-plane ZnO films on perovskite oxides with thin homointerlayer

“…Both O and Zn atoms exist on the growing surface of aplane ZnO. Therefore, native defects are energetically favorable and [20]. From Fig.…”