Effects of radio frequency power on structural, optical, and electronic properties of sputter-deposited ZnO:B thin films

Wong, L. M.; Lai, Yi-Sheng

doi:10.1007/s00339-018-1883-z

Cited by 2 publications

(1 citation statement)

References 56 publications

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“…Many methods have been used to deposit GZO films, such as RF magnetron sputtering, pulsed laser deposition, atomic layer deposition [8][9][10]. From these deposition methods, RF magnetron sputtering has been investigated due to the many advantages such as low substrate temperature and large scale deposition [11][12][13]. In this study, GZO thin films were deposited by the RF magnetron sputtering with base pressure.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of Ga doped ZnO Thin Films Deposited by RF Magnetron Sputtering with Base Pressure

Kim

2019

Appl. Sci. Converg. Technol.

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Ga doped ZnO thin films were deposited with various base pressure by RF magnetron sputtering, and their structural, optical, and electrical properties were studied. Effects of base pressure on the properties of Ga doped ZnO thin films were confirmed and a high quality thin film was obtained by controlling the base pressure. In our case, as the base pressure decreases, the crystal quality is improved, the surface roughness is increased, the sheet resistance is decreased and the figure of merit is increased. According to X-ray diffraction results, the decrease of sheet resistance is caused by increasing the grain size. The transmittance in visible region (400~800 nm) had 85~87%. Therefore, the base pressure is a key parameter for obtaining high quality film.

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Section: Introductionmentioning

confidence: 99%

Characteristics of Ga doped ZnO Thin Films Deposited by RF Magnetron Sputtering with Base Pressure

Kim

2019

Appl. Sci. Converg. Technol.

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Substrate temperature dependence of material, optical, and electronic properties of boron-doped ZnO thin films

Wong

Lai

2021

Optical Materials

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Effects of radio frequency power on structural, optical, and electronic properties of sputter-deposited ZnO:B thin films

Cited by 2 publications

References 56 publications

Characteristics of Ga doped ZnO Thin Films Deposited by RF Magnetron Sputtering with Base Pressure

Characteristics of Ga doped ZnO Thin Films Deposited by RF Magnetron Sputtering with Base Pressure

Substrate temperature dependence of material, optical, and electronic properties of boron-doped ZnO thin films

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