Effects of oxygen contents on the electrochromic properties of tungsten oxide films prepared by reactive magnetron sputtering

Lu, Horng-Hwa

doi:10.1016/j.jallcom.2007.10.105

Cited by 70 publications

(36 citation statements)

References 23 publications

(26 reference statements)

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“…Electrochromic devices have received a great deal of attention among researchers for their potential technological applications such as smart windows, reflectance-adjustable car rearview mirrors and high contrast non-emissive information displays, due to their open-circuit memory, low power consumption and high coloration efficiency (CE) [2][3][4][5][6]. Among various EC oxides of transition metals, nickel oxide/hydroxide is an anodic coloring material which is able to change color from transparent to a deep brown at positive potentials and is reversibly bleached when a negative potential is applied [7].…”

Section: Introductionmentioning

confidence: 99%

Structural, electrochemical and optical properties of NiOxHy thin films prepared by electrochemical deposition

Liu

Yan

Liu

et al. 2009

Journal of Alloys and Compounds

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Section: Introductionmentioning

confidence: 99%

Structural, electrochemical and optical properties of NiOxHy thin films prepared by electrochemical deposition

Liu

Yan

Liu

et al. 2009

Journal of Alloys and Compounds

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“…The deposition rate of films decreased by increasing oxygen flow rate in the sputtering chamber, at 30% oxygen content WO3 film show highest deposition rate at 1.736nm/min. Besides, higher oxygen content causes smaller incident energy of Ar ions on target in magnetron sputtering chamber, thus produce a gradually decrease of deposition rate [4]. Fig.2 illustrates the abilities of current to flow on WO3 thin film based on resistivity of films.…”

Section: B Characterizationmentioning

confidence: 99%

“…It indicated that the film is in amorphous state or mixed amorphous and nanocrystalline in nature. The amorphous diffraction pattern may cause by amorphous property and internal stress of WO3 films [4]. The surface morphological features of WO3 thin films are presented in Fig.4.…”

Section: A Structure and Compositionmentioning

confidence: 99%

Influence of Oxygen Flow Rate on the Characteristics of the Tungsten Oxide Using RF Magnetron Sputtering

Abdullah

Nayan

Sahdan

2015

AMM

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Abstract-Tungsten Oxide (WO3) thin films were deposited using 99.9% pure tungsten target onto ITO substrate using RF magnetron sputtering in the range oxygen flow rates of 30-50%. The influence of the oxygen flow rate on characteristic of WO3 thin films has been investigated. The transmittance, resistivity, crystallite, roughness, and surface morphology were measured by UVVis, 2-point probe, X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM), and Field Emission Scanning Electron Microscopy (FE-SEM) respectively. Experimental result showed that the deposition rate of WO3 thin films decreased by increasing oxygen flow rate. A poor crystalinity or more too amorphous of WO3 thin films produces by using various oxygen content. A higher optical transmittance spectrum detected at 30% oxygen content about 86% at wavelength 550nm. I.INTRODUCTION WO3 have been studied due to their characteristic on optical transmittance since 1980s with the realization WO3 acting as electrochromic materials. The most promising WO3 widely used in smart glass, gas sensor, automotive rear-view mirrors, and sun roofs [1]. WO3 shows a strong ion intercalation behavior which is this ion insertion is combined with a strong change of the oxide and this effect is exploited intensively in electrochromic (EC) device [2]. Several method for prepared a WO3 have been studied by researcher include vacuum evaporation, pulse laser deposition, magnetron sputtering, spray pyrolysis, chemical vapor deposition (CVD), electrodeposition and solgel deposition [3]. RF and DC Magnetron Sputtering process widely used due to better adhesion on the substrate and Sputter deposited films have a composition close to source material. Since the electrical properties, optical properties and microstructure of the sample is depend on the sputtering condition, thus it is important to control sputtering parameter to obtain a good WO3 thin film for EC materials. In this study we examine influence of oxygen flow on WO3 thin film using 30-50% oxygen flow by using flow ratio of O2/(Ar +O2).

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“…These oxides possess not only excellent electronic transport properties due to their unique crystal structure [1], but also technical applications in electrochromic devices [2][3], humidity sensors [4], photocatalyst devices [5], etc. In recent years, it has been reported that cesium tungsten bronze (Cs 0.33 WO 3 ) exhibits higher visible transparency and broad waveband absorption (800-15,000 nm) [6], which have potential applications in the field of heat insulating film [7] and photothermal ablation therapy [8].…”

Section: Introductionmentioning

confidence: 99%

Synthesis and characterization of F-doped Cs0.33WO3−F particles with improved near infrared shielding ability

Liu

Luo

Shi

et al. 2015

Journal of Solid State Chemistry

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Effects of oxygen contents on the electrochromic properties of tungsten oxide films prepared by reactive magnetron sputtering

Cited by 70 publications

References 23 publications

Structural, electrochemical and optical properties of NiOxHy thin films prepared by electrochemical deposition

Structural, electrochemical and optical properties of NiOxHy thin films prepared by electrochemical deposition

Influence of Oxygen Flow Rate on the Characteristics of the Tungsten Oxide Using RF Magnetron Sputtering

Synthesis and characterization of F-doped Cs0.33WO3−F particles with improved near infrared shielding ability

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