2001 Proceedings. 51st Electronic Components and Technology Conference (Cat. No.01CH37220)
DOI: 10.1109/ectc.2001.927983
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Effects of O/sub 2//C/sub 2/F/sub 6/ plasma descum with RF cleaning on via formation in MCM-D substrate using photosensitive BCB

Abstract: In this paper, we present the effect of plasma descum by O 2 /C 2 F 6 gas mixture on the via formation of photosensitive BCB layer and compare it with that of RF cleaning. Test vehicle was fabricated on Si wafer with Cu/photosensitive BCB layer structure and ECR-CVD system was used to descum the via. Residues at via bottom after the descum process were investigated by AES (auger electron microscope) and SEM (scanning electron microscope). It is shown in this work that O 2 /C 2 F 6 plasma etching and the RF cle… Show more

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Cited by 3 publications
(2 citation statements)
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“…In previous works, a multilayer packaging structure is achieved by using dry etching vias in BCB to realize interconnection [9]. Due to the high cost of dry etching and the development of BCB material, photosensitive BCB is used in high-frequency millimeter wave multichip modules extensively [10][11][12]. GE company has proposed a high density interconnection (GE-HDI) technology which is a process for interconnecting bare chips bonded to substrate with ultra-fine metal lines and vias drawn with the help of a computerguided laser [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…In previous works, a multilayer packaging structure is achieved by using dry etching vias in BCB to realize interconnection [9]. Due to the high cost of dry etching and the development of BCB material, photosensitive BCB is used in high-frequency millimeter wave multichip modules extensively [10][11][12]. GE company has proposed a high density interconnection (GE-HDI) technology which is a process for interconnecting bare chips bonded to substrate with ultra-fine metal lines and vias drawn with the help of a computerguided laser [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…It can be seen form Table IV that there was Si in the polyimide and BCB of this study. In microelectronic industry, plasma containing or other fluorine containing gas is usually used to descum the Si containing BCB or PI via [11]. If no-fluorine containing plasma is used for the descum process, layer may form on the top surface, and prevent further descum process of the plasma.…”
Section: B Xps Analysis Of Passivation Surfacementioning
confidence: 99%