2011
DOI: 10.1109/tns.2011.2171995
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Effects of Ion Atomic Number on Single-Event Gate Rupture (SEGR) Susceptibility of Power MOSFETs

Abstract: 3International Rectifier Corporation 4Naval Surface Warfare Center 5MEI Technologies 35-WORD ABSTRACTThe relative importance of heavy-ion interaction with the oxide, charge ionized in the epilayer, and charge ionized in the drain substrate, on the bias for SEGR failure is experimentally investigated.

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Cited by 22 publications
(9 citation statements)
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References 12 publications
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“…This SV is based on two observations obtained from the TCAD simulations: 1) the area under the channel and neck regions is the most sensitive and 2) charge generated near the epi/substrate junction is more likely to produce SEB than charge generated nearer to the surface. This effect is consistent with the prior work on single-event gate rupture showing that the region of charge deposition can influence device response [23]. Although the failure mechanism considered here (SEB) is different, both mechanisms are triggered by rearrangement of the potential in the epi region.…”
Section: Neutron-induced Seb Sensitive Volumesupporting
confidence: 91%
“…This SV is based on two observations obtained from the TCAD simulations: 1) the area under the channel and neck regions is the most sensitive and 2) charge generated near the epi/substrate junction is more likely to produce SEB than charge generated nearer to the surface. This effect is consistent with the prior work on single-event gate rupture showing that the region of charge deposition can influence device response [23]. Although the failure mechanism considered here (SEB) is different, both mechanisms are triggered by rearrangement of the potential in the epi region.…”
Section: Neutron-induced Seb Sensitive Volumesupporting
confidence: 91%
“…However, the physical mechanisms of the capacitor SEGR response have not been well studied. The capacitor SEGR response was studied by Sexton et al based on the concept of the plasma pipe [98][99][100][101][102][103]. A model to describe the transient electric field induced by the ion strike in oxide was proposed by Luo Y.H.…”
Section: Influence Of High-energy Particles On Semiconductor Devicesmentioning
confidence: 99%
“…DSEE mechanisms research continues to be an active area of inquiry, and each new study emphasizes that DSEE susceptibility cannot be characterized purely in terms of ion LET [8]- [12]. Single-event latchup (SEL) is a parasitic bipolar effect in CMOS circuits (see Fig.…”
Section: Dsee Mechanisms and Representative Svmentioning
confidence: 99%
“…Single-event gate rupture (SEGR) in power MOSFETs depends not just on the charge generated by an ion in the SV, but also on the ion angle of incidence and even its atomic number Z [8] (see Fig. 3).…”
Section: Dsee Mechanisms and Representative Svmentioning
confidence: 99%
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