Effects of insulator surface roughness on Al-alloy film properties and electromigration performance in Al-alloy/Ti insulator layered interconnects

Onoda, Hiroshi; Narita, Tadashi; Touchi, Kenshin; Hashimoto, Kazuhito

doi:10.1116/1.588999

Cited by 14 publications

(2 citation statements)

References 6 publications

(10 reference statements)

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“…The crystal structure and topography of the substrate also affects the structure of the deposited thin film. To this effect, it was demonstrated that the roughness of underlying substrate gets transferred to sputtered aluminum thin films and affects the reflectivity of the film [341], deposition of identical films onto different substrate materials was shown to result in varying grain size, resistivity, stress, and hardness [342] and the superconducting transition temperature, film stress and crystalline phase transition of tungsten thin film was shown to depend on the substrate up on which the deposition was done [316]. The crystal orientation of the underlying substrate can also alter the preferred grain orientation of sputtered films [336].…”

Section: J3 Properties Of Sputter Deposited Thin Filmmentioning

confidence: 99%

Search for lightly ionizing particles using CDMS-II data and fabrication of CDMS detectors with improved homogeneity in properties

Prasad

2013

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Fundamental particles are always observed to carry charges which are integral multiples of one-third charge of electron, e/3. While this is a well established experimental fact, the theoretical understanding for the charge quantization phenomenon is lacking. On the other hand, there exist numerous theoretical models that naturally allow for existence of particles with fractional electromagnetic charge. These particles, if existing, hint towards existence of physics beyond the standard model.Multiple high energy, optical, cosmological and astrophysical considerations restrict the allowable mass-charge parameter space for these fractional charges. Still, a huge unexplored region remains.The Cryogenic Dark Matter Search (CDMS-II), located at Soudan mines in northern Minnesota, employs germanium and silicon crystals to perform direct searches for a leading candidate to dark matter called Weakly Interacting Massive Particles (WIMPs). Alternately, the low detection threshold allows search for fractional electromagnetic-charged particles, or Lightly Ionizing Particles (LIPs), moving at relativistic speed. Background rejection is obtained by requiring that the magnitude and location of energy deposited in each detector be consistent with corresponding "signatures" resulting from the passage of a fractionally charged particle. In this dissertation, the CDMS-II data is analyzed to search for LIPs, with an expected background of 0.078±0.078 events. No candidate events are observed, allowing exclusion of new parameter space for charges between e/6 and e/200.With primary aim to increase sensitivity to detect WIMPs, it is necessary to expand the detector count and mass by more than two orders of magnitude over CDMS-II. This also increases sensitivity to detect LIPs. It becomes imperative ii to obtain repeatability in the detection sensor quality over multiple detectors. In this dissertation, we also describe the improvements and process flow optimizations implemented to obtain higher yield in fabrication of useful detectors with homogeneous sensor properties within each detector and among different batches. It also allows for reduction in fabrication time, cost and removal of avoidable cost-intensive steps like ion-implantation. Most important is the control in obtaining tungsten thin film with desired superconducting transition temperature and improvements in photolithographic steps for sensor fabrication.iii

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Section: J3 Properties Of Sputter Deposited Thin Filmmentioning

confidence: 99%

Search for lightly ionizing particles using CDMS-II data and fabrication of CDMS detectors with improved homogeneity in properties

Prasad

2013

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“…[1][2][3][4]. These detrimental occurrences promote optical reflectance degradation [5][6][7] and electromigration phenomenon (mass transport), bringing down operation effectiveness and useful lifetime of micro-electronic-mechanical systems (MEMs), i.e., the intended application of these materials [8][9][10]. Furthermore, the structural studies of metallic films through X-ray diffraction have found that the deposited material can have amorphization or low crystallinity [7,11,12].…”

Section: Introductionmentioning

confidence: 99%

Morphological and Structural Characterization of Magnetron-Sputtered Aluminum and Aluminum-Boron Thin Films

Barajas-Valdés

Suárez

2021

Crystals

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In microelectronic mechanical systems applications, sputtered aluminum thin films may have large roughness, which promotes the optical degradation and electromigration. This challenge motivated the present research, where magnetron sputtering equipped by radio frequency allowed for preparing aluminum and aluminum-boron thin films. This study evaluated the effect of the sputtering power and the substrate type (silicon wafer and glass slides) on the deposited films. The film’s morphology and structure were characterized via an atomic force microscope and X-ray diffraction. Pure aluminum films’ topographic findings revealed a 25.23 nm average roughness with larger grain size and hillock formation. Conversely, the aluminum-boron films possessed a 3.41 nm average roughness, with smaller grains and hillocks suppression when higher sputtering power was used. The pure aluminum films’ structural analysis uncovered a material with low crystallinity, with (111) and (200) planes diffracting X-rays. On the other hand, aluminum-boron films displayed better crystallinity and a preferential (111) texture. Further characterization demonstrated how the sputtering power, the substrate material, and the studied targets affected the films’ morphological and structural. The improvements in morphological and structural aspects that were observed in the films that were obtained via the aluminum-boron target sputtering make this methodology an appealing alternative for metal films manufacturing.

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The influence of substrate bias in I-PVD process on the properties of Ti and Al alloy films

Zhang

Tao

et al. 2006

J Mater Sci: Mater Electron

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Effects of insulator surface roughness on Al-alloy film properties and electromigration performance in Al-alloy/Ti insulator layered interconnects

Abstract: Articles you may be interested inEffect of the Ti/TiN bilayer barrier and its surface treatment on the reliability of a Ti/TiN/AlSiCu/TiN contact metallization J.Effect of Al ion implantation on the adhesion of Al films to SiO2 substrates

Cited by 14 publications

References 6 publications

Search for lightly ionizing particles using CDMS-II data and fabrication of CDMS detectors with improved homogeneity in properties

Search for lightly ionizing particles using CDMS-II data and fabrication of CDMS detectors with improved homogeneity in properties

Morphological and Structural Characterization of Magnetron-Sputtered Aluminum and Aluminum-Boron Thin Films

The influence of substrate bias in I-PVD process on the properties of Ti and Al alloy films

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