2009
DOI: 10.1016/j.jcrysgro.2009.06.014
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Effects of initial stages on the crystal quality of nonpolar a-plane AlN on r-plane sapphire by low-pressure HVPE

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Cited by 23 publications
(14 citation statements)
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“…Here, u is the angle of rotation about the surface normal and v is the angle of sample tilted about the axis formed by the intersection of the Bragg and scattering planes. After tilting the sample to the suitable v for specific off axis reflections, U scan were performed to find the GaN (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) and sapphire (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) reflections for sample A and GaN (0002) and sapphire (20)(21)(22)(23)(24) reflections for sample B. Due to symmetry of hexagonal structure, when a tilt of v ¼ 60 is made, both GaN (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) and sapphire (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) peaks showed a two fold symmetry.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Here, u is the angle of rotation about the surface normal and v is the angle of sample tilted about the axis formed by the intersection of the Bragg and scattering planes. After tilting the sample to the suitable v for specific off axis reflections, U scan were performed to find the GaN (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) and sapphire (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) reflections for sample A and GaN (0002) and sapphire (20)(21)(22)(23)(24) reflections for sample B. Due to symmetry of hexagonal structure, when a tilt of v ¼ 60 is made, both GaN (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) and sapphire (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) peaks showed a two fold symmetry.…”
Section: Resultsmentioning
confidence: 99%
“…When nitridation treatment was given to the substrate, the epilayers exhibited a distinct structural difference compared to the corresponding ones with no nitridation treatment. [21][22][23][24] Kehagias et al 25 26 AlN layer hence formed promotes the growth of GaN epilayer in the (10-10) orientation. The optical properties of GaN films were characterized by room temperature PL measurement using a He-Cd laser (k ¼ 325 nm) as the excitation source and is shown Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The internal fields can be strongly reduced by changing the epitaxial growth direction from the conventional polar c - direction into less polar crystal directions 5 . Based on this idea, researchers have made great efforts to fabricate semi-polar AlN on r -sapphire, r -LiAlO2, a -ZnO, a - and m-plane SiC 6 7 8 9 10 . However, the epitaxy on such non- c-plane wafers is much more challenging than that on conventional polar c-plane sapphire or SiC 11 .…”
mentioning
confidence: 99%
“…However, there has been no report about the growth of thick nonpolar AlN (1 1 2 0) and (1 1 0 0) layers by HVPE. Recently, we have reported on the low-pressure LP-HVPE growth of thick AlN (1 1 2 0) layers on sapphire (1 1 0 2) substrates using a high growth temperature and a two-step buffer method [12,13].…”
Section: Introductionmentioning
confidence: 99%