2007
DOI: 10.1143/jjap.46.2325
|View full text |Cite
|
Sign up to set email alerts
|

Effects of Heterointerface Flatness on Device Performance of InP-Based High Electron Mobility Transistor

Abstract: We achieved a current gain cutoff frequency ( f T ) of 310 GHz at a cryogenic temperature (16 K) in a 195-nm-long gate In 0:75 Ga 0:25 As/In 0:52 Al 0:48 As high-electron-mobility transistor (HEMT) fabricated on a (411)A-oriented InP substrate. This is 27% higher than that at room temperature (245 GHz). For a corresponding HEMT fabricated on a (100) InP substrate, f T of 268 GHz was also obtained at 16 K, which is 15% higher than that obtained at 300 K (233 GHz). For both (411)A and (100) HEMTs, this significa… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
3
0

Year Published

2011
2011
2023
2023

Publication Types

Select...
3
2

Relationship

0
5

Authors

Journals

citations
Cited by 6 publications
(3 citation statements)
references
References 14 publications
0
3
0
Order By: Relevance
“…It is assumed that the improved flatness reduces the interface roughness scattering of the electrons. [ 26 ]…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…It is assumed that the improved flatness reduces the interface roughness scattering of the electrons. [ 26 ]…”
Section: Resultsmentioning
confidence: 99%
“…It is assumed that the improved flatness reduces the interface roughness scattering of the electrons. [26] The surface condition was changed by Si doping, which may have been because of the Si which acts as an antisurfactant. [27] Because the N-polar Al 0.1 Ga 0.9 N has a large step structure, as shown in Figure 4b, we speculate that in N-polar Si-Al 0.1 Ga 0.9 N with a Si-doping depth of 2.5-17.5 nm, Si prevents nuclei expansion in the nucleation stage, resulting in improved flatness.…”
Section: Methodsmentioning
confidence: 99%
“…As mentioned briefly in the Introduction, the heterointerface quality is of importance in device performance, and also of interest in studies investigating various quantum phenomena . Therefore, in the following we thoroughly investigate the material composition and crystal quality of the heterointerfaces in our wurtzite InAs–GaSb(–InAs) core–shell(–shell) nanowires, namely the radial interfaces between wurtzite InAs core and GaSb shell, and between the GaSb shell and the outer InAs shell.…”
Section: Resultsmentioning
confidence: 99%