Effects of H2O on structure of acid-catalysed SiO2 sol-gel films

Fardad, M. A.; Yeatman, Eric M.; Dawnay, E. J. C.; Green, Mino; Horowitz, Flávio

doi:10.1016/0022-3093(94)00661-x

Cited by 74 publications

(31 citation statements)

References 12 publications

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“…Therefore, as the increase of R w value, the microspheres inner structure consisted of very dense silica matrix surrounding some globules. These results, indicative of more complete hydrolysis and greater density with increasing R w , are in agreement with other workers (28,29). Similar results have been reported by Yu and co-workers (30).…”

Section: Resultssupporting

confidence: 95%

Preparation of Silica Particles Encapsulating Retinol Using O/W/O Multiple Emulsions

Lee

Moon

et al. 2001

Journal of Colloid and Interface Science

113

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Section: Resultssupporting

confidence: 95%

Preparation of Silica Particles Encapsulating Retinol Using O/W/O Multiple Emulsions

Lee

Moon

et al. 2001

Journal of Colloid and Interface Science

113

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“…SiO 2 Sol-Solution Preparation: Silica thin films were prepared via a similar method to that described by Fardad et al [28]. Briefly, tetraethylorthosilicate (TEOS, 5 mL, 0.110 mol) and EtOH (5 mL) were mixed in a round bottom flask for 10 min.…”

Section: Methodsmentioning

confidence: 99%

Sol-Gel Based Vertical Optical Microcavities with Quantum Dot Defect Layers

et al. 2008

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The interaction between CdSe-CdS-ZnS semiconductor quantum dot emitters (QDs) and sol–gel based asymmetric Bragg microcavities is studied. It is found that the quality factor (Q) of such microcavities is limited by interlayer diffusion. This results in maximum Q values of less than 100. Despite this, these structures still exhibit optical signatures characteristic of the Purcell effect, where large modifications to the photoluminescence properties of QDs are observed

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“…For a silica film, which remained amorphous, Parrill [51] found that the stress rose to 200 MPa at 200~ and reached a maximum of 550 MPa at 500~ where most of the organics and hydroxyls were eliminated; if the film was cooled from 500~ the stress relaxed as the newly formed siloxane bonds rehydrolyzed. Fardad et al [52] also found that most of the stress in a silica film resulted from pyrolysis of the organics; the higher the water content in the sol, the lower the residual organic content in the gel film, and the lower the stresses produced during pyrolysis.…”

Section: Constraint Of Shrinkage By the Substratementioning

confidence: 95%

Sintering of sol-gel films

Scherer

1997

J Sol-Gel Sci Technol

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Abstract. The sintering of films differs from that of bulk gels in several ways. The initial state of a film is generally denser and less crosslinked than a bulk gel made from the same sol, and these factors enhance the densification rate of the film. The substrate constrains the shrinkage of the film, leading to high stresses that retard densification and can influence phase changes. The substrate is a site for heterogeneous nucleation, and crystallization makes densification more difficult, so the competition between sintering and crystallization is particularly important for films. Fast heating favors densification over crystallization, so rapid thermal annealing usually produces denser films. The high surface to volume ratio of a thin film makes it susceptible to degradation by reaction with the substrate and the atmosphere, so choosing compatible materials and avoiding over-firing is essential.

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Effects of H2O on structure of acid-catalysed SiO2 sol-gel films

Cited by 74 publications

References 12 publications

Preparation of Silica Particles Encapsulating Retinol Using O/W/O Multiple Emulsions

Preparation of Silica Particles Encapsulating Retinol Using O/W/O Multiple Emulsions

Sol-Gel Based Vertical Optical Microcavities with Quantum Dot Defect Layers

Sintering of sol-gel films

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