Effects of growth atmosphere and homo-buffer layer on properties of ZnO films prepared on Si(111) by PLD

Hydrothermally grown ZnO buffer layer for the growth of highly (4wt%) Ga-doped ZnO epitaxial thin films on MgAl2O4 (111) substrates

“…The XRD and TEM results shown in Figs. 1-3 are wellconsistent with previous reports [29][30][31]. Therefore, 4 wt% Gadoped ZnO thin films with a ð0001Þ½112 0 GZO :ð111Þ½112 MgAl 2 O 4 epitaxial orientation relationship can be grown at low growth temperature of 250 1C by introducing a hydrothermally grown ZnO buffer layer between the GZO thin film and substrate.…”

Effect of a ZnO buffer layer on the properties of Ga-doped ZnO thin films grown on Al2O3 (0001) substrates at a low growth temperature of 250°C

“…Therefore, it is believed that our experimental results, which showed improved electrical and optical characteristics of GZO thin film on a buffered substrate, as compared to GZO thin film on a non-buffered substrate, can be attributed to the improved crystal quality, less defects and grain boundaries. Our experimental results are quite consistent with those of previously reported phenomena [26][27][28].…”

“…Our experimental results of XRD and TEM shown in Figs. 1-3 are also quite consistent with those of previous reports [26][27][28]. By introducing a ZnO buffer layer, epitaxial GZO thin films can be grown even at a low temperature (250 1C) with high Ga doping concentration of 4 wt%.…”

“…1 and 2(a). Previous reports have indicated that epitaxial ZnO films can be grown on a buffered substrate without the formation of any other interfacial layer by reducing the mismatch of the lattice constant and thermal expansion coefficient between a film and a substrate [26][27][28]. Our experimental results of XRD and TEM shown in Figs.…”

Fabrication and Characterisation of ZnO Thin Film by Sol–Gel Technique

“…Therefore, ZnO thin films are promising candidates for applications in short-wavelength light-emitting devices, lasers, field emission devices, solar cells and sensors [1][2][3][4][5][6]. Nanocrystalline ZnO thin films can be produced by several techniques such as reactive evaporation [7], molecular beam epitaxy (MBE), magnetron sputtering technique [8], pulsed laser deposition (PLD) [9], spray pyrolysis [10], sol-gel process [11], chemical vapor deposition, and electrochemical deposition [12].…”