Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films

Aramwit, C.; Intarasiri, S.; Bootkul, D.; Tippawan, U.; Supsermpol, B.; Seanphinit, N; Ruangkul, W.; Yu, L.D.

doi:10.1016/j.apsusc.2014.01.097

Cited by 3 publications

(2 citation statements)

References 21 publications

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“…TiO2 films with anatase phase are used as self-cleaning windows, antifogging glass, self-sterilizing, and anti-bacterial tiles, as well as for water purification devices [2]. Anatase TiO2 is also known for its use as a photoanode in Dye Sensitized Solar Cells [3]. Among the TiO2 phases, the rutile phase is chemically and thermodynamically more stable and has the highest refractive index and hardness [4].…”

Section: Introductionmentioning

confidence: 99%

Tailoring Crystalline Structure of Titanium Oxide Films for Optical Applications Using Non-Biased Filtered Cathodic Vacuum Arc Deposition at Room Temperature

Guillén,

Krause,

Heras

et al. 2021

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Titanium oxide films were deposited at room temperature and with no applied bias using a filtered cathodic vacuum arc (FCVA) system in a reactive oxygen environment. The dependence of film growth on two process parameters, the working pressure (Pw) and the O2 partial pressure (pO2), is described in detail. The composition, morphological features, crystalline structure, and optical properties of the deposited films were systematically studied by Rutherford Back Scattering (RBS), Scanning Electron Microscopy (SEM), X-Ray diffraction (XRD), Raman Spectroscopy, UV-vis spectroscopy, and spectroscopic ellipsometry. This systematic investigation allowed the identification of three different groups or growth regimes according to the stoichiometry and the phase structure of the titanium oxide films. RBS analysis revealed that a wide range of TiOx stoichiometries (0.6 < × < 2.2) were obtained, including oxygen-deficient, stoichiometric TiO2 and oxygen-rich films. TiO, Ti2O3, rutile-type TiO2, and amorphous TiO2 phase structures could be achieved, as confirmed both by Raman and XRD. Therefore, the results showed a highly versatile approach, in which different titanium oxide stoichiometries and crystalline phases especially suited for diverse optical applications can be obtained by changing only two process parameters, in a process at room temperature and without applied bias. Of particular interest are crystalline rutile films with high density to be used in ultra-high reflectance metal-dielectric multilayered mirrors, and reduced-TiO2 rutile samples with absorption in the visible range as a very promising photocatalyst material.

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Section: Introductionmentioning

confidence: 99%

Tailoring Crystalline Structure of Titanium Oxide Films for Optical Applications Using Non-Biased Filtered Cathodic Vacuum Arc Deposition at Room Temperature

Guillén,

Krause,

Heras

et al. 2021

Coatings

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“…Compared with these deposition techniques, the filtered cathodic vacuum arc discharge (FCVAD) shows many significant advantages. For example, it has a high deposition rate and good adhesion, which can effectively decrease large particles on the surface . Moreover, it is easy to control the composition of TiN films by adjusting the deposition parameters, which makes the FCVAD technique more widely used for industrial applications…”

Section: Introductionmentioning

confidence: 99%

Microstructure and Tribological Behavior of Stripe Patterned TiN Film Prepared with Filtered Cathodic Vacuum Arc Deposition (FCVAD)

Chen

2017

Adv Eng Mater

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This paper describes an experimental investigation into the influence of the stripe interspace and applied load on the tribological behavior of stripe patterned TiN films. The stripe patterned TiN films are deposited on an H13 steel surface by masked deposition with the filtered cathodic vacuum arc discharge (FCVAD) technique. The surface micro morphology, chemical composition, crystal structure, and mechanical properties of the films is characterized using 3D white light interferometry, scanning electron microscopy (SEM), X-ray diffractometry (XRD), and a nano-indentation tester, respectively. The tribological performance of patterned TiN is measured using a UMT-5 tribometer, and the friction and wear mechanisms are analyzed, compared with that of the full TiN film and H13 steel substrate. The results show that the stripe patterned TiN films has better tribological properties than the full TiN film. These results are attributed to the synergistic effect between the surface pattern and the TiN film. The stripe interspace and the applied load has a more significant effect on the wear rate of the stripe patterned TiN films than the coefficient of friction of their friction pairs. A further study, however, is needed to analyze the relationship between the applied load and the wear rates of the stripe patterned TiN films.

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Recent developments on green synthesised nanomaterials and their application in dye-sensitised solar cells

Chaudhari

Darvekar²,

Nasikkar

et al. 2022

International Journal of Ambient Energy

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Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films

Cited by 3 publications

References 21 publications

Tailoring Crystalline Structure of Titanium Oxide Films for Optical Applications Using Non-Biased Filtered Cathodic Vacuum Arc Deposition at Room Temperature

Tailoring Crystalline Structure of Titanium Oxide Films for Optical Applications Using Non-Biased Filtered Cathodic Vacuum Arc Deposition at Room Temperature

Microstructure and Tribological Behavior of Stripe Patterned TiN Film Prepared with Filtered Cathodic Vacuum Arc Deposition (FCVAD)

Recent developments on green synthesised nanomaterials and their application in dye-sensitised solar cells

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