Effects of deposition temperature on the structural and morphological properties of thin ZnO films fabricated by pulsed laser deposition

Khandelwal, Rakhi; Singh, Amit Pratap; Kapoor, Avinashi; Grigorescu, Sorin Dan; Miglietta, P.; Stankova, N.E.; Perrone, A.

doi:10.1016/j.optlastec.2007.04.011

Cited by 28 publications

(9 citation statements)

References 12 publications

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“…Thus, we also performed X-ray diffraction measurement under Θ-2Θ-geometry (Fig. 3b); they show the "tendency" of the grown film to the (002)-orientation which is in good agreement with the results in the literature [26][27][28].…”

Section: Film Structure and Surface Morphologysupporting

confidence: 88%

Using the acetylacetonates of zinc and aluminium for the Metalorganic Chemical Vapour Deposition of aluminium doped zinc oxide films

Nebatti

Pflitsch

Curdts

et al. 2015

Materials Science in Semiconductor Processing

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Section: Film Structure and Surface Morphologysupporting

confidence: 88%

Using the acetylacetonates of zinc and aluminium for the Metalorganic Chemical Vapour Deposition of aluminium doped zinc oxide films

Nebatti

Pflitsch

Curdts

et al. 2015

Materials Science in Semiconductor Processing

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“…These observations suggest that there could be an optimum range of substrate temperature to obtain the best surface quality. This is in agreement with the results of other studies [18][19][20]. For example, Liu et al [21] observed similar phenomena for ZnO coatings obtained by the PLD method.…”

Section: Methodssupporting

confidence: 92%

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

Piwowarczyk

Jędrzejewski

Baranowska

2017

Materials Science-Poland

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The paper presents results of the investigation on the influence of deposition parameters, such as substrate temperature, total gas pressure and reactive gas composition on the structure, chemical composition and mechanical properties of aluminum oxynitride coatings obtained by pulsed laser deposition (PLD) method. Selection of process parameter ranges, which could be promising for aluminum oxynitride (ALON) coatings deposition, was the main objective of the work. Two series of experiments were carried out with varied pressure and temperature. It was found that from the chemical composition viewpoint, the most promising are atmospheres containing 20 % to 40 % oxygen. The nitrogen to oxygen ratios in the coatings can be controlled by increasing the total pressure or substrate temperature. However, increasing the pressure has a negative effect on the O + N:Al ratio, mechanical properties and quality of the coatings. The influence of temperature is much less drastic and more controllable. Increasing the deposition temperature is much more beneficial since it improves the mechanical properties and can compensate to some extent the negative effect of the total pressure. From the coating quality viewpoint, it is possible to establish an optimum temperature range for which the coatings are characterized by a compact structure and a limited number of droplets.

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“…Overall, it is found that polycrystalline films are grown; the ZnO (002) and ZnO (103) diffractions peaks are observed in all patterns at 34.45° and 62.9°, respectively. The same diffraction peaks were observed in the work of R. Khandelwal et all [9]. However, several of the zinc oxide reflections are missing, indicating a preferred orientation of the films.…”

Section: Resultssupporting

confidence: 82%

Rapid Thermal (RT) MOCVD of Undoped and Al Doped ZnO Thin Films

Nebatti¹,

Pflitsch²,

Eckert³

et al. 2009

ECS Trans.

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Undoped and aluminum doped zinc oxide thin films were deposited on Si (100) and borosilicate glass substrates by using a novel RT-MOCVD technique, which is based on the use of the thermal radiation of tungsten lamps for substrate heating. The films were deposited from the acetylacetonates of zinc and aluminum which were used as precursors in the presence of oxygen. As result, well ordered and homogeneous ZnO films were grown. The undoped films show a preferred orientation on both substrates while the grains of the polycrystalline aluminum doped films are randomly ordered. Additionally whisker growth was observed for the doped films. As confirmed by EDX analysis, the amount of aluminum dopant was precisely controlled by varying the flows of transport gas through the evaporators. Finally, it has been found that all the films shown over 65 % optical transparency in the visible range.

show abstract

Effects of deposition temperature on the structural and morphological properties of thin ZnO films fabricated by pulsed laser deposition

Cited by 28 publications

References 12 publications

Using the acetylacetonates of zinc and aluminium for the Metalorganic Chemical Vapour Deposition of aluminium doped zinc oxide films

Using the acetylacetonates of zinc and aluminium for the Metalorganic Chemical Vapour Deposition of aluminium doped zinc oxide films

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

Rapid Thermal (RT) MOCVD of Undoped and Al Doped ZnO Thin Films

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