Rapid Thermal (RT) MOCVD of Undoped and Al Doped ZnO Thin Films

Abstract

Undoped and aluminum doped zinc oxide thin films were deposited on Si (100) and borosilicate glass substrates by using a novel RT-MOCVD technique, which is based on the use of the thermal radiation of tungsten lamps for substrate heating. The films were deposited from the acetylacetonates of zinc and aluminum which were used as precursors in the presence of oxygen. As result, well ordered and homogeneous ZnO films were grown. The undoped films show a preferred orientation on both substrates while the grains of the polycrystalline aluminum doped films are randomly ordered. Additionally whisker growth was observed for the doped films. As confirmed by EDX analysis, the amount of aluminum dopant was precisely controlled by varying the flows of transport gas through the evaporators. Finally, it has been found that all the films shown over 65 % optical transparency in the visible range.

Investigation on the electrocatalytic oxidation of alcohol using zinc oxide thin films deposited by pulsed electrodeposition on an indium tin oxide surface

“…Solar cells [11], sensors [12], batteries [13], smart windows [14], photocatalysts [15], etc., all make use of ZnO to varying degrees. Sputtering [16], chemical vapor deposition [17,18], sol-gel using a spin coating or dip coating procedure [19,20], electrodeposition [21], hydrothermal growth [22,23], and spray pyrolysis [24] are only some of the methods that have been used to create ZnO thin films. Since it is straightforward, inexpensive, and can potentially be used for massive industrial production, the electrodeposition method stands out as a crucial and straightforward technology for the creation of thin films.…”