Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering

Zhou, Yan; Xie, Zhong; Xiao, Hanning; Hu, Peng; He, Jianyu

doi:10.1016/j.vacuum.2008.07.002

Cited by 35 publications

(22 citation statements)

References 18 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…TO1 film shows sharp edges particles over the coating surface. This morphology, according with Zhou et al [43], is related with the mixture of α and β Ta phases, which is in good agreement with XRD results. The surface micrographs (see Figure 2) …”

Section: Accepted Manuscriptsupporting

confidence: 90%

“…% the crystal structure changed to a mixture of α-Ta and β-Ta phases. This behavior was also observed by Zhou et al [43,44] in the Ta The coating with the highest oxygen content was amorphous. This behavior is usually observed for other oxygen-containing compounds deposited by reactive magnetron sputtering as, for example, W-O [46], W-O-N [47], TiC x O y [48] and Ti-Si-C-N-O [49].…”

Section: Accepted Manuscriptsupporting

confidence: 82%

See 1 more Smart Citation

Bioactivity response of Ta 1-x O x coatings deposited by reactive DC magnetron sputtering

Alves

Cavaleiro

Carvalho

2016

Materials Science and Engineering: C

View full text Add to dashboard Cite

The use of dental implants is sometimes accompanied by failure due to periimplantitis disease and subsequently poor esthetics when soft-hard tissue margin recedes. As a consequence, further research is needed for developing new bioactive surfaces able to enhance the osseous growth. Tantalum (Ta) is a promising material for dental implants since, comparing with titanium (Ti), it is bioactive and has an interesting chemistry which promotes the osseointegration. Another promising approach for implantology is the development of implants with oxidized surfaces since bone progenitor cells interact with the oxide layer forming a diffusion zone due to its ability to bind with calcium which promotes a stronger bond. In the present report Ta-based coatings were deposited by reactive DC magnetron sputtering onto Ti CP substrates in an Ar+O2 atmosphere. In order to assess the osteoconductive response of the studied materials, contact angle and in vitro tests of the samples immersed in Simulated Body Fluid (SBF) were performed. Structural results showed that oxide phases where achieved with larger amounts of oxygen (70 at.% O). More compact and smooth coatings were deposited by increasing the oxygen content. The as-deposited Ta coating presented the most hydrophobic character (100°); with increasing oxygen amount contact angles progressively diminished, down to the lowest measured value, 63°. The higher wettability is also accompanied by an increase on the surface energy. Bioactivity tests demonstrated that highest O-content coating, in good agreement with wettability and surface energy values, showed an increased affinity for apatite adhesion, with higher Ca/P ratio formation, when compared to the bare Ti substrates.

show abstract

Section: Accepted Manuscriptsupporting

confidence: 90%

Section: Accepted Manuscriptsupporting

confidence: 82%

Bioactivity response of Ta 1-x O x coatings deposited by reactive DC magnetron sputtering

Alves

Cavaleiro

Carvalho

2016

Materials Science and Engineering: C

View full text Add to dashboard Cite

show abstract

“…Bulk α-Ta phase with low resistivity of 15-60 μ -cm [4] shows excellent physical and chemical properties such as a high melting point of 2996 • C, good ductility, and excellent corrosion resistance in aggressive environments. In contrast to the tough and ductile α-Ta phase, β-Ta phase with higher resistivity of 170-210 μ -cm [4] is hard and brittle, and its presence compromises the coating integrity under strain [5]. The low resistivity α-phase tantalum is preferred to reduce interconnection resistance and is desirable for thin film interconnection.…”

Section: Introductionmentioning

confidence: 99%

Investigation of the Structure and Properties of Nanoscale Grain-Size β-Tantalum Thin Films

Solati

Dorranian

2013

Molecular Crystals and Liquid Crystals

View full text Add to dashboard Cite

Nanoscale grain-size tantalum films with tetragonal crystalline structure were prepared on BK7 glass and 304 steel by low power direct current magnetron sputtering at room temperature. Effect of deposition time on structural and electrical properties of tantalum thin films has been investigated. In all cases, highly preferred (330) orientation can be observed in X-ray diffraction measurements. With increasing the thickness of deposited films from 152 to 388 nm, a weak X-ray photon peak is diffracted from (720) planes of β-Ta. The atomic force microscopy micrographs show the grain size of 20-30 and 100-140 nm for films deposited on glass and steel substrates respectively. Deposition rate was approximately constant. The resistivity of samples on glass substrate is decreased with increasing the time of deposition. Transmittance of deposited films on glass substrate is decreased with increasing the thickness of sample.

show abstract

“…Since sputtering is a non-equilibrium process, the metastable β-phase Ta [47] or mixed phase Ta is more common to be observed in sputter deposited thin films [48][49][50][51]. The β-to-α transition is promoted by heating up to 400°C during deposition [52] or to 650-1000 °C after deposition [53,54]. The ion bombardment during deposition was shown to bring to different Ta phases dependent on the deposition system and bombarded ions kinetic energy and momentum [55][56][57].…”

Section: Nb-ta Alloy Sputteringmentioning

confidence: 99%

Co-sputtered amorphous Nb–Ta, Nb–Zr and Ta–Zr coatings for corrosion protection of cyclotron targets for [18F] production

Skliarova

Azzolini

Johnson

et al. 2015

Journal of Alloys and Compounds

View full text Add to dashboard Cite

Protective corrosion resistant coatings serve for decreasing the amount of ionic contaminants from Havar ® entrance foils of the targets for [ 18 F] production. The corrosion damage of coated entrance foils is caused mainly by the diffusion of highly reactive products of water radiolysis through the protective film towards Havar ® substrate. Since amorphous metal alloys (metallic glasses) are well-known to perform a high corrosion resistance, the glass forming ability, microstructure and diffusion barrier efficiency of binary alloys containing chemically inert Nb, Ta, Zr were investigated. Nb-Ta, Nb-Zr and Ta-Zr films of different alloy composition and ~1.5 μm thickness were co-deposited by magnetron sputtering. Diffusion barrier efficiency tests used reactive aluminum underlayer and protons of acid solution and gallium atoms at elevated temperature as diffusing particles. Though cosputtered Nb-Ta and Nb-Zr alloy films of different contents were crystalline, Ta-Zr alloy was found to form dense amorphous microstructures in a range of composition with 30-73% atomic Ta. The diffusion barrier efficiency of Nb-Zr and Nb-Ta alloy coatings decreased with increase of Nb content. The diffusion barrier efficiency of sputtered Ta-Zr alloy coatings increased with the transition from nanocrystalline columnar microstructure to amorphous for coatings with 30-73% at. Ta.

show abstract

Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering

Cited by 35 publications

References 18 publications

Bioactivity response of Ta 1-x O x coatings deposited by reactive DC magnetron sputtering

Bioactivity response of Ta 1-x O x coatings deposited by reactive DC magnetron sputtering

Investigation of the Structure and Properties of Nanoscale Grain-Size β-Tantalum Thin Films

Co-sputtered amorphous Nb–Ta, Nb–Zr and Ta–Zr coatings for corrosion protection of cyclotron targets for [18F] production

Contact Info

Product

Resources

About