2003
DOI: 10.1002/mop.10790
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Effects of CMOS process fill patterns on spiral inductors

Abstract: Spiral inductors with various metal fill‐patterns under the spiral is fabricated with SOI CMOS technology and characterized up to 49 GHz. The impact of the fill on the inductor characteristics is found to be very small and changes can be attributed to the increase of parasitic capacitance. A simple model is proposed that can accurately estimate the increase of capacitance. A simple model is proposed that can accurately estimate the increase of capacitance by the fill. Design guidelines for optimizing fill patt… Show more

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Cited by 10 publications
(8 citation statements)
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“…In order to accurately understand the physical behavior of the Faraday cage, Fig. 9(a) shows a simplified equivalent circuit used for modeling each single spiral inductor [12]. The spiral inductor structure is represented by an inductance L s , a series resistance R s , the coupling capacitance C c and resistance R c .…”
Section: Lumped Modeling Of Noise Coupling Effectsmentioning
confidence: 99%
“…In order to accurately understand the physical behavior of the Faraday cage, Fig. 9(a) shows a simplified equivalent circuit used for modeling each single spiral inductor [12]. The spiral inductor structure is represented by an inductance L s , a series resistance R s , the coupling capacitance C c and resistance R c .…”
Section: Lumped Modeling Of Noise Coupling Effectsmentioning
confidence: 99%
“…The power dissipated in the metal fills is an additional loss mechanism for the inductor and thus reduces its . However, (5) illustrates that this extra loss can be significantly reduced by using metal fills with small fill cell sizes. The equations in (5) provide guidelines on device sizing inside an inductor but are not sufficiently accurate for quantitative estimates.…”
Section: Metal Fill Test Structuresmentioning
confidence: 99%
“…The presence of conducting fill underneath an inductor naturally changes the electromagnetic field distribution, and hence the characteristic inductor's parameters. The effect of the dummy metal pattern on the same metal layer as the on-chip inductor [5] and under the spiral [6] with different pattern and configuration of the fill has already been reported. The most significant influence of the metal fill on the inductor performance is the change in the self resonance frequency which has the highest value for an inductor with no fill.…”
Section: Introductionmentioning
confidence: 96%