Effects of annealing temperature on the structural and photoluminescence properties of nanocrystalline ZrO2 thin films prepared by sol–gel route

Joy, K.; Berlin, I. John; Nair, Prabitha B.; Lakshmi, Jaya; Daniel, Georgi P.; Thomas, P.V.

doi:10.1016/j.jpcs.2011.02.012

Cited by 86 publications

(40 citation statements)

References 33 publications

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“…A decrease of refractive indices with oxygen partial pressure is also obtained and reported by Shen et al [10] for ZrO 2 thin films prepared at different oxygen partial pressures. The refractive index values of the zirconium oxide thin films calculated in the present study are in good agreement with the value reported by [10][11][12].…”

Section: Resultssupporting

confidence: 92%

“…The tetragonal ZrO 2 phases can be observed in annealing times in range120-240 min due to the oxidation of zirconium films after thermal annealing in oxygen atmosphere. Also, nanocrystalline tetragonal ZrO 2 thin films at different annealing temperatures was obtained by Joy et al [12] Up to annealing time of 180 min the peak along with (111) plane of tetragonal ZrO 2 phase can be observed and the crystallography direction, changes to (002) direction at annealing time of 240 min. The surface morphology of thin films is one of the important factors that can influence the thin films applications.…”

Section: Resultsmentioning

confidence: 95%

“…Zirconia thin films (ZrO 2 ) are one of the transition-metal oxides with outstanding physical, optical and chemical properties [1][2][3][4][5][6][7][8][9][10][11][12][13][14] including high hardness, low electrical conductivity, high melting point, good thermodynamic stability in contact with silicon, transparency in the visible and near-infrared region, high refractive index, high dielectric constant and large optical band gap [2,10,11].…”

Section: Introductionmentioning

confidence: 99%

“…Rebib et al [11] have studied the structural and optical properties of zirconia thin films deposited by sputtering a ZrO 2 target under an argon-oxygen gas mixture and different total gas pressures. The sol-gel dip coating method was used for the preparation of highly transparent nanocrystalline zirconia thin films by Joy et al [12]. RF sputtering deposition was employed by Yildiz et al [13] for preparation of nanocrystalline zirconia thin films with high transparency.…”

Section: Introductionmentioning

confidence: 99%

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Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Hojabri

2016

J Theor Appl Phys

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Zirconium oxide thin films were grown successfully by thermal annealing of zirconium thin films deposited on quartz and silicon substrates by direct current magnetron sputtering technique. The structural and optical properties in relation to thermal annealing times were investigated. The X-ray diffraction patterns revealed that structure of films changes from amorphous to crystalline by increase of annealing times in range 60-240 min. The composition of films was determined by Rutherford back scattering spectroscopy. Atomic force microscopy results exhibited that surface morphology and roughness of films depend on the annealing time. The refractive index of the films was calculated using Swanepoel's method. The optical band gap energy of annealed films decreased from 5.50 to 5.34 eV with increasing thermal annealing time.

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Section: Resultssupporting

confidence: 92%

Section: Resultsmentioning

confidence: 95%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Hojabri

2016

J Theor Appl Phys

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“…1b-e). The presented XRD diagrams agree well with the reports on ZrO 2 thin films prepared using sol gel method by Joy et al [11]. The XRD results show that by increasing the annealing times from 60 to 180 min the intensity of the peaks slightly decreases (Figs.…”

Section: Resultssupporting

confidence: 90%

Optical Properties of Nano-Crystalline Zirconia Thin Films Prepared at Different Post-Oxidation Annealing Times

Hojabri

Pourmohammad

2016

Acta Phys. Pol. A

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The zirconia (ZrO2) is one of the transition-metal oxides with most excellent optical properties which thus attracts great attention in optical engineering. A variety of methods were used for deposition of ZrO2 thin films on different substrates. In the present work, homogenous, transparent nanocrystalline zirconia thin films were grown by thermal oxidation of zirconium (Zr) thin films deposited on quartz substrate using DC magnetron sputtering technique. The objective of this study is to reveal the effect of thermal oxidation time on structural and optical properties of deposited films. The XRD results revealed the formation of single phase ZrO2 with tetragonal structure in the films at different thermal oxidation times. The optical constant of ZrO2 thin films was calculated from the UV-visible transmission spectra. It was found that the increase of thermal oxidation time leads to the increase of transmittance and optical band gap energy of the films. The AFM results showed that thermal oxidation time influences the surface morphology of the films.

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Advancement of Surface by Applying a Seemingly Simple Sol‐gel Oxide Materials

Krzak

Borak

Łukowiak

et al. 2016

Advanced Surface Engineering Materials

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Effects of annealing temperature on the structural and photoluminescence properties of nanocrystalline ZrO2 thin films prepared by sol–gel route

Cited by 86 publications

References 33 publications

Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Optical Properties of Nano-Crystalline Zirconia Thin Films Prepared at Different Post-Oxidation Annealing Times

Advancement of Surface by Applying a Seemingly Simple Sol‐gel Oxide Materials

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