Effects of (100)-textured LaNiO₃ Electrode on the Deposition and Characteristics of PbTiO₃ Thin Films Prepared by rf Magnetron Sputtering

Abstract

Highly (100)-oriented thin films of PbTiO3 were prepared on (100)-textured LNO/Pt/Ti/SiO2/Si substrates by rf magnetron sputtering at temperatures ≥480 °C, while randomly oriented PbTiO3 films were obtained on Pt/Ti/SiO2/Si substrates. The textured LNO layer can help to control the orientation of PbTiO3 thin films, and reduce their surface roughness quite significantly. The dielectric constant (εT) of PbTiO3 films deposited on LNO was lower than that of films on Pt and the dielectric loss (tan δ) increased when a higher deposition temperature or longer time was used. The highly (100)-textured PbTiO3 films also showed different ferroelectric hysteresis characteristics, i.e., a higher coercive field and a lower remanent polarization, from that of randomly oriented films deposited on Pt.

Morphological and Structural Evolution of Chemically Deposited Epitaxially LaNiO3 Thin Films

“…Moreover, nickelates present interest due to the bandwidth-controlled metal-insulator transition [6]. LNO shows a metallic conduction down to 0.4 K [7]. Because LNO has a structure similar to that of perovskite ferroelectrics, textured and epitaxially grown LNO film has been studied intensively as electrodes [8].…”

Formation of PbTiO3 films from multilayered structures of primitive oxides

“…A variety of methods for ferroelectric PbTiO 3 thin film growth, including metal organic chemical deposition [1,2], plasma enhanced chemical vapor deposition [3], pulsed laser deposition [4], sol-gel [5], RF sputtering [6] and spray pyrolysis [7], have been used. Among these, chemical vapor deposition (CVD) using metal organic precursors is extensively used, as this method offers a high level of controllability of the film crystallinity and electrical properties as well as good step coverage, a high deposition rate and the possibility of commercial-based production.…”

Room‐Temperature Conducting LaNiO3 Thick‐Film Coatings Prepared by Aerosol Deposition

“…However, nickel compounds with a Ni formal valency higher than two are usually unstable at a high temperature, which necessitates that their synthesis temperature be reduced, if possible 2 . Many studies have investigated LaNiO 3 preparations with powders 3–5 and thin‐film forms, 6–8 but none have reported on dense and pure perovskite phase LaNiO 3 bulk or thick ceramic film fabrication because of the material phase change into La 2 NiO 4 at sintering temperatures above 1000°C, which shows no metallic conductivity.…”