2010
DOI: 10.1163/016942409x12584625925187
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Effects in Surface Free Energy of Sputter-Deposited VNx Films

Abstract: Vanadium nitride (VN x ) thin films have attracted much attention for semiconductor integrated circuit (IC) packaging molding dies, and forming tools due to their excellent hardness and, thermal stability. VN x thin films with VN 0.45 , VN 0.83 , VN 1.22 , VN 1.73 , VN 2.06 were prepared using a radio frequency (RF) sputter technique. The experimental results showed that the contact angle at 20 • C increases with increasing nitrogen content of the VN x films, to 101.4 • corresponding to VN 1.73 and then decrea… Show more

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Cited by 3 publications
(3 citation statements)
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“…The wettability and hydrophilicity of VN coatings were increased with the increase of N 2 partial pressure. The observed wettability properties and hydrophilicity of VN coatings were superior to the values reported so far in the literature [24,25].…”
Section: Surface Topography and Wetting Behaviorcontrasting
confidence: 59%
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“…The wettability and hydrophilicity of VN coatings were increased with the increase of N 2 partial pressure. The observed wettability properties and hydrophilicity of VN coatings were superior to the values reported so far in the literature [24,25].…”
Section: Surface Topography and Wetting Behaviorcontrasting
confidence: 59%
“…There are two major factors that can affect coating's contact angle: the low surface energy and the surface roughness [38][39][40]. According to Fan et al [25], the surface free energy linearly increase with increasing surface roughness in VN coatings. In present work as the N 2 partial pressure increased to 40%, the increase in WCA could be related to appearance of highly intense crystalline plane with lower surface energy (200).…”
Section: Surface Topography and Wetting Behaviormentioning
confidence: 99%
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