2022
DOI: 10.1016/j.tsf.2022.139122
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Effectiveness of tungsten addition on the performance of electroplated nickel diffusion barriers for copper metallization on textured silicon

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Cited by 2 publications
(2 citation statements)
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“…Besides observing a sharpening of the peaks in those samples with heat treatment, two smaller peaks around 45° are observed in the high-temperature MF sample. According to the literature, these peaks correspond to the Cu 3 Si intermetallic phase, which is formed due to the interdiffusion of these elements at high temperatures [ 48 , 49 , 50 ]. This observation is in good agreement with the FESEM images of this sample in Figure 6 , where an interaction between copper and silicon can be seen in the cross-section image.…”
Section: Resultsmentioning
confidence: 99%
“…Besides observing a sharpening of the peaks in those samples with heat treatment, two smaller peaks around 45° are observed in the high-temperature MF sample. According to the literature, these peaks correspond to the Cu 3 Si intermetallic phase, which is formed due to the interdiffusion of these elements at high temperatures [ 48 , 49 , 50 ]. This observation is in good agreement with the FESEM images of this sample in Figure 6 , where an interaction between copper and silicon can be seen in the cross-section image.…”
Section: Resultsmentioning
confidence: 99%
“…Electroplating is a well-known, low-cost, and easy-to-carry-out coating deposition process which has been in use for many decades. The coatings produced are mainly metallic anticorrosive coatings, but also diffusion barriers [21][22][23]. Due to the many possibilities and advantages of this method, the coatings produced in this way are still the subject of scientific research [24,25].…”
Section: Introductionmentioning
confidence: 99%