Effective fabrication of three-dimensional nano/microstructures in a single step using multilayered stamp

Abstract

A technique in ultraviolet nanoimprint lithography ͑UV-NIL͒ for the creation of three-dimensional ͑3D͒ nanopatterns in a single step is proposed. The single-step fabrication of 3D or multilevel structures has a multitude of benefits. Inherent in this is the elimination of a need for alignment for multilevel fabrications as well as being a cost effective and simple process. For 3D UV-NIL, a trial in the fabrication of multilayered stamps has been conducted employing two-photon polymerization and diamondlike carbon ͑DLC͒ coating technique. The DLC coating layer enables the polymer patterns to be used effectively as a stamp without the need for an antiadhesion material. Additionally, O 2-plasma ashing has the potential for an epoch-making improvement of the precision of polymer patterns with a linewidth of 60 nm. Overall, several fine patterns are imprinted using the multilayered stamp onto a UV-curable resist via a single-step process without any identifiable damage.

Rapid prototyping of micro-optics on organic light emitting diodes and organic photo cells by means of two-photon 3D lithography and nano-imprint lithography

“…The methods are already established in the fabrication of structures at the micro-and nano-scale, such as waveguides in glass [10], phase lenses and mirrors [11] or photonic crystals [12], including also special design rules for shape compensation [13] and their combination is of growing interest [4]. The basic principle is of both methods is shown in Fig.…”

“…The plasma treatment reduces the line width of the stamper to about 60nm, which is below common feature sizes achieved by 2P3DL. 3D structures and multilevel structures could be demonstrated by combining these two lithographic methods without the need of several common and expensive imprinting stampers that need to be aligned relative to each other [4].…”

A Magneto‐catalytic Writing Technique for Etching Complex Channel Patterns into Graphenic Carbons

“…to integrated electronic circuits, [3] to lithographic masks, [4,5] to material coatings designed for biocompatibility, [6] lubrication, [7] or thermal and electrical conductivity. [8] Proposed patterning methods include lithography, [9,10] transfer printing, [11,12] plasma etching, [13,14] and electrocatalysis.…”

Adaptive bonding technique for precise assembly of three-dimensional microstructures

“…8,9 Further, research on the development of various schemes for effective 3D fabrication are continuously conducted as TPP is expected to be applied to more and more widely ranging processes and applications. [10][11][12][13] Despite this promising potential of TPP, there are still important issues to be settled, including how 3D microstructures can be fabricated on opaque substrates, such as silicon wafers and metal layers, regardless of the surface flatness, and how 3D structures can be placed on microsystems to realize their specific function in the system. Although direct fabrication of 3D microstructures on opaque materials and inside systems containing macroscale components should be possible using TPP, precisely controlling a tightly focused beam on a large area with a nanostage is generally cost prohibitive.…”

“…We have set up an optical laser system for preparing the 3D stamps; the used materials, detailed specifications, and operation of the system were explained in previous work of some of the authors. [10][11][12][13] To evaluate the usefulness of CPL, we transferred some 3D microstructures onto the surface of a Si wafer. The adhesive layer on the substrate was a commercial UV-curable resin, AMO NIL-MMS10 ͑from AMO GmbH͒.…”