Molybdenum
trioxide (MoO3), an important transition
metal oxide (TMO), has been extensively investigated over the past
few decades due to its potential in existing and emerging technologies,
including catalysis, energy and data storage, electrochromic devices,
and sensors. Recently, the growing interest in two-dimensional (2D)
materials, often rich in interesting properties and functionalities
compared to their bulk counterparts, has led to the investigation
of 2D MoO3. However, the realization of large-area true
2D (single to few atom layers thick) MoO3 is yet to be
achieved. Here, we demonstrate a facile route to obtain wafer-scale
monolayer amorphous MoO3 using 2D MoS2 as a
starting material, followed by UV–ozone oxidation at a substrate
temperature as low as 120 °C. This simple yet effective process
yields smooth, continuous, uniform, and stable monolayer oxide with
wafer-scale homogeneity, as confirmed by several characterization
techniques, including atomic force microscopy, numerous spectroscopy
methods, and scanning transmission electron microscopy. Furthermore,
using the subnanometer MoO3 as the active layer sandwiched
between two metal electrodes, we demonstrate the thinnest oxide-based
nonvolatile resistive switching memory with a low voltage operation
and a high ON/OFF ratio. These results (potentially extendable to
other TMOs) will enable further exploration of subnanometer stoichiometric
MoO3, extending the frontiers of ultrathin flexible oxide
materials and devices.