2018
DOI: 10.1109/tns.2018.2843260
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Effect of Transistor Variants on Single-Event Transients at the 14-/16-nm Bulk FinFET Technology Generation

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Cited by 19 publications
(5 citation statements)
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“…Overall, an increased cross-section for the circuits based on the LP technology is noticed. This behavior is in agreement with the literature, in which it was shown that the increase on the threshold voltage leads to degradation of driving strength capability [40][41][42]. The NAND gates are the most sensitive to this V TH variation with a cross-section increase of 95% and 85% for the NAND_X1 and NAND_X2, respectively.…”
Section: Set Immunity Of Standard-cell Logic Gatessupporting
confidence: 92%
“…Overall, an increased cross-section for the circuits based on the LP technology is noticed. This behavior is in agreement with the literature, in which it was shown that the increase on the threshold voltage leads to degradation of driving strength capability [40][41][42]. The NAND gates are the most sensitive to this V TH variation with a cross-section increase of 95% and 85% for the NAND_X1 and NAND_X2, respectively.…”
Section: Set Immunity Of Standard-cell Logic Gatessupporting
confidence: 92%
“…However, the fringing electric field is enhanced due to the ferroelectric material polarization, which increases the current driven capability 13 . It has been indicated that the device with a larger driven current was better immunity to SET 3 , 6 . This means that the increase of the driven current leads to the decrease of the collected charge by the drain.…”
Section: Impact Of Spacer On Setmentioning
confidence: 99%
“…The reason may be that due to TID irradiation, the threshold voltage of the device reduces, which leads to the driven current of the device increase. A larger driven current gets a good immunity to SET [16,20], resulting in the collected charge decrease. Simultaneously, after TID irradiation, large numbers of the positive hole trap charges are captured by the gate oxide [16].…”
Section: Set Response Of Finfet After Tidmentioning
confidence: 99%