Effect of Thickness on Photocatalytic Properties of ZnO thin films Deposited by RF Magnetron Sputtering

Effect of Deposition Temperature on Morphological, Optical, and Photocatalytic Properties of ZnO Thin Films Synthesized by Ultrasonic Spray Pyrolysis Method

“…The strong intensity of (002) peak confirms the good crystalline quality of the films, knowing that the growth of ZnO along this preferred orientation was observed in intrinsic ZnO films for all growth methods except epitaxy. [ 18 ] It should be noticed for ZT250, ZT350 and ZT450 the diffracted peaks are closely in the same position without angle shifts. Thus, to validate the preferred orientation in each thin film, the texture coefficient TC (hkl) was calculated using Harris method: [ 19 ] $$\begin{equation}T{C_{{\rm{hkl}}}} = \frac{{\frac{{I{{\left( {hkl} \right)}_{\rm{i}}}}}{{{I_0}\left( {hkl} \right)}}}}{{\left( {\frac{1}{n}} \right)\mathop \sum \nolimits_{\rm{i}}^{\rm{n}} \frac{{I{{\left( {hkl} \right)}_{\rm{i}}}}}{{{I_0}\left( {hkl} \right)}}}}\end{equation}$$where TC hkl is the texture coefficient of ( hkl ) plane, I ( hkl) i is the measured peak intensity of ( hkl ) plane for the i th peak , I 0 ( hkl ) is the standard intensity ( JCPDS ) of ( hkl ) plane for the i th peak, and n is the number of diffraction peaks.…”

Fabrication and Analysis of Ion-Engineered ZnO Device Structures for Optoelectronic Applications

“…Both silicon and glass substrates were cleaved and placed into the magnetron sputtering chamber. The deposition process was carried out at room temperature (21 o C), using a 3-inch diameter ZnO target composed of 99.9% pure ZnO disk and having a density of 5.61 g/cm 3 . A DC magnetron sputtering system was employed for the deposition of the ZnO thin film.…”

“…In recent years significant progress has been made in the development of wide band-gap based semiconductor optoelectronic devices aiming to improve device parameters, such as efficiency, detection range, and gains [2]. Zinc oxide (ZnO) has gained widespread attention in this context due to its inherent advantages, including wide band gap, high carrier mobility, high stability, radiation tolerance, and large excitation energy (60 meV) at room temperature [3,4]. These properties make ZnO highly desirable for optoelectronic applications, as it exhibits strong light-matter interactions and sustains its excitons at room temperature, enabling strong electromagnetic spectrum emission capabilities [1,5].…”

Highly efficient and Reusable ZnO microflower photocatalyst on stainless steel mesh under UV–Vis and natural sunlight

“…There is contradictory views on effect of film thickness for photocatalytic activity. Some report suggest that increase of film thickness improves the photocatalytic activity whereas some researcher showed that film thickness has no effect on photocatalytic activity [33][34][35].P. Jongnavakit et al have used sol gel derived ZnO thin film on glass substrate for degradation of Methylene Blue (MB) [36].…”