2015
DOI: 10.1063/1.4935481
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Effect of thickness on dielectric, ferroelectric, and optical properties of Ni substituted Pb(Zr0.2Ti0.8)O3 thin films

Abstract: (PZTNi30) thin films for various thicknesses, ranging from 5 nm to 400 nm, were fabricated by pulsed laser deposition technique. Giant dielectric dispersion, low dielectric loss, large dielectric constant $1000-1500 from 100 Hz to 100 kHz, and diffused dielectric anomaly near 570-630 K were observed in PZTNi30 thin films. These films show well saturated ferroelectric hysteresis, with large remanent polarization. It also illustrated excellent optical transparency which decreased from 82 to 72% with increasing f… Show more

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Cited by 31 publications
(15 citation statements)
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References 65 publications
(99 reference statements)
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“…Fig. 1g shows that the bandgap of the PZT film is approximately 3.2 eV, which is in agreement with previous reports in the literature [26]. Upon externally applied mechanical agitation, the UV-SPPD generates electrical signals by converting mechanical energy into electricity that is then measured and analyzed.…”
Section: Device Fabrication and Materials Characterizationsupporting
confidence: 90%
“…Fig. 1g shows that the bandgap of the PZT film is approximately 3.2 eV, which is in agreement with previous reports in the literature [26]. Upon externally applied mechanical agitation, the UV-SPPD generates electrical signals by converting mechanical energy into electricity that is then measured and analyzed.…”
Section: Device Fabrication and Materials Characterizationsupporting
confidence: 90%
“…All of the observed peaks were assigned to PFN and NZFO, corresponding to perovskite phase with the monoclinic and cubic phase crystal structure respectively 31,34 . In order to explore the effect of strain on the ferroelectric, magnetic and magnetoelectric properties of this heterostructure, the effective misfit strain was calculated 35 . Note that the LSAT substrate has a cubic crystal structure with the lattice parameter a = 3.868 Å, whereas bulk LNO has a rhombohedral crystal structure with the lattice parameter a = 3.838 Å.…”
Section: Resultsmentioning
confidence: 99%
“…In the present study, the E g calculated by assuming the allowed direct (m ¼ 2) electronic transition between valance band and conduction band. The E g value found to be decreases with rise in OMP due to the lowering of the interatomic distance, enhancement in the grain size, and increase of crystallinity [47,48]. The E g values of the KNN1G films are in the range of 4.20e4.30 eV and were slightly less compare to the pure KNN (4.29e4.37 eV) thin films [14].…”
Section: Linear and Nonlinear Optical Propertiesmentioning
confidence: 97%