2016
DOI: 10.1088/0022-3727/49/37/375104
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Effect of thermal annealing treatments on the optical activation of Tb3+ -doped amorphous SiC:H thin films

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Cited by 8 publications
(19 citation statements)
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“…The change in luminescence can be related to the increase in Urbach energy discussed in section 3.4. The increase in Ubrach energy indicates an increase in the density of defect states, which could lead to an increase in the luminescent centers introduced within the forbidden gap under an appropriate excitation . Process of luminescence, also depends on the host electronic properties such as localized states …”
Section: Resultsmentioning
confidence: 99%
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“…The change in luminescence can be related to the increase in Urbach energy discussed in section 3.4. The increase in Ubrach energy indicates an increase in the density of defect states, which could lead to an increase in the luminescent centers introduced within the forbidden gap under an appropriate excitation . Process of luminescence, also depends on the host electronic properties such as localized states …”
Section: Resultsmentioning
confidence: 99%
“…Doping wide bandgap semiconductors (WBS) such as ZnO, AlN, GaN, SiN, SiC with rare earth (RE) ions have received the attention of scientific community due to their application in micro and nanooptoelectronics such as display panels, laser material, data storage, fiber amplifiers, and solid state lasers. [1][2][3][4][5] In the recent past, interest has grown due to nature of the electronic levels present in these rare earth elements. [6] Rare earth ions in the trivalent form (RE 3þ ) are almost insensitive to the atomic environment due to the electronic shield provided by the outermost and completely filled 5s 2 and 5p 6 shells.…”
Section: Introductionmentioning
confidence: 99%
“…The same emission bands were identified also for samples annealed at other temperatures (not shown here). These transitions and their spectral positions are very similar to the emission lines of Tb 3+ ions embedded in silicon oxide [18], silicon oxynitride [19,20], or silicon carbide films [21] and their overall shape does not change after annealing. Finally, it should be underlined that measured PL spectra did not show any signature of the broad matrix-related PL which has been reported by other authors for undoped SiN x films [13,22].…”
Section: Methodsmentioning
confidence: 59%
“…Nevertheless, it should be pointed out that the optimal annealing temperature can be different if the annealing conditions change or Tb concentration is different. As shown by Guerra et al [21] the annealing of Tb-doped thin films is a rather complicated issue and depends on many factors.…”
Section: Resultsmentioning
confidence: 99%
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