Effect of the Twins on Mechanical Properties of AISI 304 Stainless Steel Wire Using Electrical Current Method

Abstract

Electrical current process has been used in the thin plate metals and the fine wires because of its higher efficiency (rapidly recrystallization) and the advantage of avoiding oxidation without inert gas. This study investigated the transformation of twin structure and mechanical properties of 304 stainless steel after electrical current test by direct current. The results show the microstructure of matrix transported from preferred structure to equiaxed grains and a few annealed twins with increasing the current density of joule from 32 J to 188 J. The hardness of matrix remained stable under 83 J because of the number of twins increased, and the tensile properties were similar to the wire using furnace heating. After electrical current test at 188 J, the strain hardening exponent of wires was 0.44, was suitable to be used for cold work procedure.

The Effects of Crystallization on Mechanical Mechanism and Residual Stress of Sputtered Ag Thin Films

“…13) Its mechanism is an electrical current induced crystallization (EIC). 14,15) Thus, this paper not only investigates the crystallographic texture of nano Ag thin film (30 400 nm), but also discusses the solidification residual stress before and after EIC testing, as well as the near surface hardness and conductivity so as to further understand the potential for use as a thin film material.…”

Microstructural Characteristics of InGaZnO Thin Film Using an Electrical Current Method

“…7,9,10) Electrical current testing is a low temperature process carried out in atmosphere. 11) Its mechanism is an electrical current induced crystallization (EIC) 12,13) that has been largely ignored in the optoelectronic thin films until now. So, the present study performed electrical current experiments on In thin film to discuss the electrical current crystallization characteristics of the IGZO/In structure at low temperature (During electrical current testing, the surface temperature of the film was raised by joule heat and was <455 K).…”