Poly(glycidyloxypropyl)silsesquioxane
(PGPS) was successfully synthesized
by hydrolysis and polycondensation using the nitrogen flow method.
A poly(3-(2,3-dihydroxypropoxypropyl)silsesquioxane) (PSQ-OH) film
was prepared via two routes. In route A, PSQ-OH was prepared by the
hydrolysis of the epoxy group of PGPS in an aqueous hydrochloric acid
(HCl)/tetrahydrofuran solution, affording a diol group; then, PSQ-OH
was coated on a glass substrate and heated. The antifogging performance
of the PSQ-OH film was evaluated in terms of water uptake (WU) and
scratch resistance. The obtained PSQ-OH film exhibited a low WU of
5% and a scratch resistance of 1.6. In route B, PGPS was coated on
a glass substrate and immersed in a 0.5 mol/L aqueous sulfuric acid
solution for 1–15 h at room temperature, producing a diol group.
The solid-state 13C nuclear magnetic resonance spectrum
indicated that the epoxy group was completely hydrolyzed after immersion
for 15 h. The WU of the PSQ-OH film prepared via route B increased
from 5 to 19% with the increase in the immersion time and was higher
than that of the PSQ-OH film prepared via route A. The PSQ-OH film
on a glass substrate retained transparency under water vapor exposure
at 60 °C. The PSQ-OH film prepared via route B exhibited a high
scratch resistance of 2.7–3.6, similar to that of a poly(3-(2-aminoethylaminopropyl)silsesquioxane)
film. The scratch resistance of the PSQ-OH film was 5–7 times
higher than that of the poly(vinyl alcohol) film. The PSQ-OH film
was uniform with no pinholes and cracks. The PSQ-OH film was transparent
and colorless and exhibited a high transmittance of >90% in the
wavelength
range of 400–800 nm. Overall, the prepared PSQ-OH film exhibits
good antifogging, transparency, and mechanical properties.