2006
DOI: 10.1016/j.solmat.2006.02.025
|View full text |Cite
|
Sign up to set email alerts
|

Effect of the grain boundaries on the conductivity and current transport in II–VI films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
5
0

Year Published

2011
2011
2024
2024

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 23 publications
(8 citation statements)
references
References 9 publications
0
5
0
Order By: Relevance
“…This grain boundary region is highly disordered with large number of defect states due to incomplete atomic bonding or lack of stoichiometry. These states known as trap states act as effective carrier traps, impeding the flow of majority charge carriers between the grains [46]. The films deposited at higher temperatures are nearly stoichiometric and have larger grains.…”
Section: Electrical Propertiesmentioning
confidence: 99%
“…This grain boundary region is highly disordered with large number of defect states due to incomplete atomic bonding or lack of stoichiometry. These states known as trap states act as effective carrier traps, impeding the flow of majority charge carriers between the grains [46]. The films deposited at higher temperatures are nearly stoichiometric and have larger grains.…”
Section: Electrical Propertiesmentioning
confidence: 99%
“…Nanostructured materials with small size and dimension exhibit unique and significantly improved physical, chemical and biological properties, phenomena and processes remarkable in comparison with their bulk counterparts, which demonstrate their great potential applications in many novel devices of the future. A major motivation to study II-VI semiconductor group materials is that they are direct-band-gap materials [1,2] with high optical absorption and emission coefficients. Materials based on thin films are the basic elements of sustained technological advances; they possess various unique properties due to their quantum confinement effects.…”
Section: Introductionmentioning
confidence: 99%
“…The CdS layer was deposited on the CIGS layer by utilizing the chemical bath deposition (CBD) [25][26][27][28] and successively depositing the ZnO layer with the radio-frequency magnetron sputtering [29][30][31]. Then, a highly transparent ITO layer was deposited on the ZnO layer by using the direct current magnetron sputtering [32,33] to complete the 368 V, the current density sc is 31.87 mA/cm 2 , the fill factor FF is 34.57%, and the conversion efficiency is 4.05%.…”
Section: Photovoltaic Applicationsmentioning
confidence: 99%