Effect of temperature on morphologies and optical study of ZnO thin films deposited by aerosol assisted chemical vapor deposition technique

Abstract

ZnO thin films were deposited on glass substrates by an aerosol assisted chemical vapor deposition method using Zn(II) semicarbazone complexes, ZnCl2(LH)2, (where LH = semicarbazones of cinnamaldehyde, 4-flouroacetophenone, benzaldehyde and 4-chlorobenzaldehyde) as precursors. X-ray diffraction patterns of as-deposited thin films show the formation of hexagonal ZnO (ICDD: 79-2205) at all the deposition temperatures, i.e. 350 °C, 400 °C and 450 °C. The UV–visible spectra show that the thin films are transparent in the visible range. The presence of the high intensity phonon mode at 438 cm−1 in the Raman spectra indicates the wurtzite phase of the ZnO thin films. Scanning electron microscopy images reveal the formation of different morphologies, hexagonal plates, nearly spherical particles and tetrapods at different temperatures. The roughnesses of the thin films were determined using atomic force microscopy.

Antisolvent‐Enhanced Crystallization of Luminescent All‐Green Organic–Inorganic Manganese‐Halide Films Deposited by Aerosol‐Assisted Chemical Vapor Deposition Technique on Either Glass or Elastomer Substrates

“…The AACVD method has been employed extensively to deposit metal chalcogenides and oxides, such as ZnS and ZnO. [21,22] Recently, this technique has been adapted for the deposition of metal organics and metal halides based on Pb, [23,24] Sn, [25] and Cu. [26] Furthermore, AACVD offers exceptional versatility as the possibility of substituting highly toxic solvents for green solvents such as water to deposit lead-halide perovskites, and the appealing multisource capacity for transport simultaneously either precursor solutions, additives, or antisolvents from separate sources, enhancing the nucleation rate and increasing the processing window.…”