Aerosol-assisted chemical vapor deposition (AACVD) of Sb[(TePiPr2)2N]3 results in pure hexagonal Sb2Te3 nanoplates between 375 and 475 degrees C on glass substrates, with a potential for enhanced thermoelectric properties for novel nanodevices.

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Tin sulfide (SnS) thin films are deposited using simple tin thiosemicarbazone complexes of the type Bz 3 SnCl(L) (L ¼ thiosemicarbazones of salicylaldehye and 4-chlorobenzaldehyde). Thin films are deposited using aerosol-assisted (AA) CVD in the range 375-475 8C. X-ray diffraction (XRD) shows the formation of SnS regardless of growth temperature and precursor type. Scanning electron microscope (SEM) images show that the films have wafer-like morphology, and the growth temperatures do not have a profound effect on morphology.

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