Effect of surface modification on the properties of plasma‐polymerized hexamethyldisiloxane thin films

Abstract

Plasma‐polymerized hexamethyldisiloxane (pp‐HMDSO) thin films have been deposited in a radiofrequency (RF) remote plasma‐enhanced chemical vapor deposition (PECVD) system, on different types of substrates: silicon wafers, glass, quartz crystals, and chemiresistor structure. The as‐grown thin films have been post treated in two types of reactive plasmas produced in SF6 and O2 gases. The effect of this surface modification on different properties of the as‐grown pp‐HMDSO thin film (chemical structure, elemental composition, surface morphology, film density and thickness, optical bandgap, and electrical resistivity) has been investigated. It is found that SF6 plasma and O2 plasma surface modifications of the as‐grown pp‐HMDSO thin film induce property changes different from each other. SF6 plasma converted the as‐grown pp‐HMDSO film to a more porous material and caused a narrowing of its optical band gap of about 33%, while O2 plasma induced a lowering of film electrical resistivity of about two orders of magnitude.

Copper Black Coatings for the Absorption of Solar Concentration With an APPJ SiO2 Super-Hydrophobic Protection

“…A silica film was applied to some samples by the atmospheric pressure plasma jet technique, APPJ (Hilt, 2016;Darny, 2017;Teske, 2019), seeking a layer that preserves the characteristics of the black selective surfaces (Figure 4b). Hexamethyldisiloxane reagent was used as a silica precursor (Boutamine, 2014;Gilliam, 2019;Saloum, 2019;Sifuentes-Nieves, 2019;. The APPJ nozzle was on a robotic arm and the coatings were homogeneous on small and big areas.…”

Comparative investigation on organosilicon film growth by cyclonic plasma using hexamethyldisilazane and hexamethyldisilazane/nitrogen gas mixture

“…Different precursors and various deposition techniques (e.g., sol-gel, CVD, and PECVD) can be used to create organosilicon thin films. [1][2][3][4][5] The organosilicon thin films fabricated by these methods generate pure silica films and enhance their effectiveness in dissociating monomers and the intrinsic quality of the product. Organosilicon is a primary siliconbased material used in several applications, such as barrier packing for nutrition wrapping, protective corrosion films on metallic surfaces, [6][7][8] and dielectric materials in electronic devices.…”

Polymer surface modification using He/O2 RF remote low‐pressure plasma

“…Low‐pressure glow discharge plasma is well established as an attractive technique, which uses gases as reactants, to perform the surface modification of different materials such as polymers, in the purpose of altering some properties such as cross‐linking, wettability, roughness, and adhesion 1–5 . Gas discharges environments contain active simultaneously generated species such as electrons, ions, free radicals, molecular fragments, and electromagnetic radiations 6 ; these active species can modify the surface of polymers without affecting its bulk properties.…”

“…In our present work, He/O 2 plasma mixture is induced in a low‐pressure 13.56‐MHz hollow cathode discharge (Plasma Consult GmbH PlasCon HCD‐L300 System), which generates an intense (high density) primary plasma and a very homogeneous remote plasma having relatively high concentrations of free radicals and relatively low electron density 2 . The effect of helium percentage in the discharge on the different plasma parameters will be explored at a constant total pressure of about 20 Pa and at a constant applied radio frequency (RF) power of 300 W. Electron density ( n e ), effective electron temperature ( T eff ), and electron energy probability function (EEPF) are evaluated using a cylindrical Langmuir probe.…”