Effect of substrate temperature on structural, morphological and optical properties of deposited Al/ZnO films

Ghorannevis, Zohreh; Hosseinnejad, Mohammad Taghi; Habibi, Maryam; Golmahdi, P.

doi:10.1007/s40094-014-0157-1

Cited by 44 publications

(17 citation statements)

References 26 publications

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“…The agglomeration of grains is responsible for the high mobility of particles that gives larger sized structures. [44] This result is well consistent with the XRD result. The average roughness, root mean square (RMS) roughness and average height of those films were also measured.…”

Section: Surface Morphologysupporting

confidence: 91%

“…Since at high temperatures, the average roughness of the sample is higher; hence, the optical scattering is more, leading to a less transparency. [44] This result is in good consistency with the AFM results. The transmittance is almost zero at the wavelength of 300-350 nm, which is related to the onset of fundamental absorption, this represents the Blue shift phenomenon (i. e. the absorption edge was shifted toward a shorter wavelength with an increase in the deposition temperature).…”

Section: Uv-visible Spectroscopy Analysissupporting

confidence: 87%

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Temperature dependent studies on radio frequency sputtered Al doped ZnO thin film

Bhujbal¹,

Pathan²,

Chaure³

2020

Eng. Sci.

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In this work, highly conductive and transparent Al: ZnO (Al doped ZnO, i. e., AZO) thin films were grown by radio frequency (RF) magnetron sputtering technique at a typical deposition temperature. The effect of deposition temperature on the structural, morphological, optical and electrical properties was studied. The x-ray diffraction (XRD) studies revealed a hexagonal wurtzite crystal structure for all AZO layers with a (002) preferred orientation along the c-axis. Columnar, compact, uniform grain growth of the layer was observed from atomic force microscopy (AFM) images. The deposition temperature had an influence on the surface roughness and average grain size of deposited films, which could be confirmed by means of AFM images. Optical studies confirmed that both optical band gap energy and urbach energy were influenced by the substrate temperature. Highly transparent films with an energy band gap ranging from 3.48 to 3.65 eV were obtained upon changing the deposition temperature from 22 to 400. The presence of defects was confirmed by ℃ photoluminescence (PL) spectra. A systematic measurement of the electrical parameters like barrier height, and ideality factor of the devices (Ag/Al:ZnO) was carried out with the help of I-V characteristic. This study may be useful for the design and fabrication of AZO based electrodes for solar cell applications.

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Section: Surface Morphologysupporting

confidence: 91%

Section: Uv-visible Spectroscopy Analysissupporting

confidence: 87%

Temperature dependent studies on radio frequency sputtered Al doped ZnO thin film

Bhujbal¹,

Pathan²,

Chaure³

2020

Eng. Sci.

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“…This possible phenomenan may be due to the nature of the rhombohedral structure of the faces of the CuGaO2 crystal [16]. Hence, we observed from the average surface roughness in Table 3 that as the substrate temperature increases, the average surface roughness also increases with increasing grain size [17].…”

Section: Uv-vis Spectroscopy Analysismentioning

confidence: 88%

Effect of Annealing Temperature of Cugao2 thin Films by Using RF Magnetron Sputtering Technique on Optical and Structural Properties

Yip¹,

Alias²,

Awang³

et al. 2018

IJET

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Cu-based conductive oxide such as CuGaO2 is seen to be a promising transparent p-type oxide material. The study of p-type semiconductor CuGaO2 thin films have been carried out to investigate the effects of different parameters in providing the optimum result in achieving good optical transparency and conductivity of the thin film. The CuGaO2 thin films were fabricated on quartz substrate via the Radio Frequency (RF) magnetron sputtering technique with varying substrate temperatures and different annealing temperatures. The p-type thin films were deposited at a temperature ranging from room temperature, 100°C, 200°C and 300°C. The samples were also annealed varying from temperature of 500°C, 600°C, 700°C and 800°C. The fabricated sample were characterized using X-ray diffraction (XRD), UV-Visible spectroscopy, and atomic force microscope (afm). XRD showed a peak at 2θ = 36.10° (012). The optical transparency values achieved from UV-Vis spectrometer were seen to be approximately 80% and the bandgaps were found to be in the range of 3.34-3.43 eV which is in line with the bandgap value from the research on CuGaO2 thin films. From the afm, the mean surface roughness increases with increasing temperature and this is due to the increment of grain size. The highest grain size was observed at substrate temperature of 200°C.

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“…Increasing the substrate temperature while sputtering increases the deposition rate, grain size and oxygen concentration on the film. However, this increase was dominant only at substrate temperatures above 250 °C [12,24,25]. Since the substrate temperature was kept at 100 °C , there was no dominant change on the microstructure to affect the friction coefficient.…”

Section: Coefficient Of Frictionmentioning

confidence: 99%

Tribological Behaviour of Sputter Coated ZnO Thin Films

Jayatissa¹,

Ahmed²,

Manu³

et al. 2021

RPM

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The tribological properties of ZnO thin film coated on an aluminium work piece by RF magnetron sputtering were studied as a function of deposition power, substrate coating temperature, heat treatment and rotation speed. The variation in the coefficient of friction of ZnO films produced under various levels of coating parameters and conditions were experimentally determined using a pin-on-disk tribometer. The results showed that with change in deposition conditions and heat treatment, there are significant microstructural changes in ZnO films, which affect the coefficient of friction. The hardness of the prepared films was also tested using a Vickers Hardness testing machine. There was a consistent and considerable decrease in the friction coefficient of the aluminium working piece after ZnO coating. It is found that the ZnO can be used as a low friction coating material for components working under oxidative and high temperature environments.

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Effect of substrate temperature on structural, morphological and optical properties of deposited Al/ZnO films

Cited by 44 publications

References 26 publications

Temperature dependent studies on radio frequency sputtered Al doped ZnO thin film

Temperature dependent studies on radio frequency sputtered Al doped ZnO thin film

Effect of Annealing Temperature of Cugao2 thin Films by Using RF Magnetron Sputtering Technique on Optical and Structural Properties

Tribological Behaviour of Sputter Coated ZnO Thin Films

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