Effect of substrate temperature on structural and optical properties of spray deposited ZnO thin films

Larbah, Y.; Adnane, M.; Sahraoui, T.

doi:10.1515/msp-2015-0062

Cited by 16 publications

(3 citation statements)

References 13 publications

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“…Several deposition techniques have been used for the growth including, magnetic sputterig [11], laser deposition [12], sol-gel [13] and spray pyrolysis [14].…”

Section: Introductionmentioning

confidence: 99%

Properties of Undoped and (Al, In) Doped ZnO Thin Films Prepared by Ultrasonic Spray Pyrolysis for Solar Cell Applications

Djelloul¹,

Larbah²,

Adnane³

et al. 2018

J. Nano- Electron. Phys.

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Zinc oxide (ZnO) is an n-type semiconductor with a large optical gap (3.4 eV) belonging to the transparent conductive oxides family (TCO). Strongly present as optical window in the chalcopyrite based structures CIGS and CIS. The structural, morphological, optical and electrical properties of ZnO thin films deposited onto glass substrates by ultrasonic spray pyrolysis (USP) technique have been investigated. For comparison and a better understanding of physical properties of undoped and (Al, In) doped ZnO thin films, a number of techniques, including XRD, SEM, optical absorption method (UV) and four-point probe technique were used to characterize the obtained ZnO thin films. Structural analysis shows that all the films were found to be polycrystalline with a wurtzite structure and show a (1 0 1) preferential growth. Besides, we noted that the preferred orientation does not depend on the nature of dopant. The band gaps (Eg) varied from 3.35 to 3.37 eV by Al and In dopants.

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“…Several deposition techniques have been used for the growth including, magnetic sputterig [11], laser deposition [12], sol-gel [13] and spray pyrolysis [14].…”

Section: Introductionmentioning

confidence: 99%

Properties of Undoped and (Al, In) Doped ZnO Thin Films Prepared by Ultrasonic Spray Pyrolysis for Solar Cell Applications

Djelloul¹,

Larbah²,

Adnane³

et al. 2018

J. Nano- Electron. Phys.

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“…Due to internal structural faults like oxygen and zinc gaps, or interstitial conditions in a lattice, ZnO is an n-type semiconductor material [7]. ZnO nanostructured thin films have been produced using a variety of methods, including thermal evaporation [8], magnetron sputtering [8], sputtering [9], chemical vapor [10], and ion-beam assisted [11]. The laser-induced plasma (LIP) approach is one of the most popular and alluring methods for creating nanostructured thin films with a particular property [12].…”

Section: Introductionmentioning

confidence: 99%

Synthesis and Characterization ofZrO2:ZnO Nanoparticles Prepared by Laser Induced Plasma

A. Mohammed,

Hashim

2023

ANJS

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n this research, we looked at how laser energy affected the structural and optical characteristics of ZrO2:ZnO thin films at mixing ratios(0.1, 0.2, 0.3and0.4) that were applied on glass slides using the pulse laser deposition technique (PLD). Nd:YAG laser was utilized with a wavelength of 1064 nm, a pulse width of 9 ns, and an energy of 320 mJ. The X-ray diffraction patterns revealed that all the films had a polycrystalline hexagonal crystal structure. AFM was used to measure the topography of the film's surface, and the results revealed that the average roughness and grain size increased. After analyzing the optical characteristics of each film, it was discovered that the absorption coefficient in the 200–1000 nm wavelength range increases at 320 mJ of laser energy and that the optical energy gap value for indirect permitted transitions decreases between 3.58 and 3.4eV

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“…Numerous mechanisms have been utilized to manufacture nanostructured thin films for ZnO, such as thermal evaporation [5], magnetron sputtering [3], sputtering [6], chemical vapor [7] or ion-beam assisted [8]. One of the most common and attractive techniques used to prepare nanostructure thin films that have a characteristic is laser induced plasma (LIP) technique [9].…”

mentioning

confidence: 99%

Studying the Effect of Annealing on Optical and Structure Properties of Zno Nanostructure Prepared by Laser Induced Plasma

Mustafa

Jamal

Aadim

2019

eijs

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In this paper, Zinc oxide were deposited on a glass substrate at room temperature (RT) and two annealing temperatures 350ÂºC and 500ÂºC using laser induced plasma technique. ZnO nanofilms of 200nm thickness have been deposited on glass substrate. X-RAY diffraction (XRD), atomic force microscopy and UV-visible spectrophotometer were used to analyze the results. XRD forms of ZnO nanostructure display hexagonal structure with three recognized peaks (100), (002), and (101) orientations at 500ÂºC annealing temperature. The optical properties of ZnO nanostructure were determined spectra. The energy gap was 3.1 eV at 300 oC and 3.25eV at 500ÂºC annealing temperature.

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Effect of substrate temperature on structural and optical properties of spray deposited ZnO thin films

Cited by 16 publications

References 13 publications

Properties of Undoped and (Al, In) Doped ZnO Thin Films Prepared by Ultrasonic Spray Pyrolysis for Solar Cell Applications

Properties of Undoped and (Al, In) Doped ZnO Thin Films Prepared by Ultrasonic Spray Pyrolysis for Solar Cell Applications

Synthesis and Characterization ofZrO2:ZnO Nanoparticles Prepared by Laser Induced Plasma

Studying the Effect of Annealing on Optical and Structure Properties of Zno Nanostructure Prepared by Laser Induced Plasma

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