Effect of substrate bias on sputter-deposited TiCx, TiNy and TiCxNy thin films

Adjaottor, Albert A.; Meletis, E. I.; Logothetidis, S.; Alexandrou, I.; Kokkou, S. C.

doi:10.1016/0257-8972(95)02594-4

Cited by 45 publications

(28 citation statements)

References 15 publications

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“…The final structure, stoichiometry, and properties of TiN x thin films mainly depend on the N 2 flow and the value of V b applied to the substrate. 7,8 As an example, we report here on the latter. Therefore, in order to develop films with different stoichiometries, deposition was carried out at various values of bias voltage V b between 0 and 2220 V and fixed N 2 flow.…”

Section: Methodsmentioning

confidence: 97%

New approach in the monitoring and characterization of titanium nitride thin films

1999

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In situ and ex situ spectroscopic ellipsometry (SE), Raman spectroscopy (RS), x-ray photoelectron spectroscopy (XPS), and Auger electron spectroscopy (AES) have been used to study the stoichiometry and characterize TiN x thin films deposited by magnetron sputtering at various stoichiometries. In situ SE can provide parameters, such as the plasma energy, that can be utilized for monitoring of the film stoichiometry. Besides plasma energy, optical phonon position in RS was also found to be a sensitive probe of TiN x stoichiometry as detected by RS, XPS, and ex situ SE. Under these conditions, AES faces difficulties for reliable film characterization, and the complementary use of other techniques is required for determining the exact film stoichiometry.

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Section: Methodsmentioning

confidence: 97%

New approach in the monitoring and characterization of titanium nitride thin films

1999

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“…They show metallic as well as covalent and ionic properties, exhibiting a unique combination of characteristics that allow them to be serious candidates for a wide range of hightechnology applications [1][2][3][4][5][6]. Beyond these technological applications that can range from several examples in metallurgy, aeronautics, electronics and medicine, used to protect and to decrease wear in a variety of components, there is also the more specific case of fundamental research, where these carbides have been revealed to be a subject of great interest [7,8]. The wide structural features revealed with, for instance, the variation of the C content, is one of the factor that is interesting for the research teams [1][2][3][4][5][6].…”

Section: Introductionmentioning

confidence: 99%

“…Carbide films can be deposited by a variety of chemical vapour deposition (CVD) and physical vapour deposition (PVD) techniques [8,[10][11][12][13][14][15]. Usually the CVD methods are limited owing not only to environmental problems, but also to the high temperatures involved during processing.…”

Section: Introductionmentioning

confidence: 99%

The influence of structure changes in the properties of TiCxOy decorative thin films

et al. 2007

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The main purpose of this work consists in the preparation of titanium oxycarbide, TiC x O y , thin films, in which the presence of oxygen changed the film properties between those of titanium carbide and those of titanium oxide. Varying the oxide/carbide ratio allowed to tune the structure of the films between titanium oxide and carbide and consequently electronic, mechanical and optical properties of the films. The depositions were carried out from a TiC target by direct current, dc, reactive magnetron sputtering, varying the oxygen flow rate. The obtained results showed that the film's properties can be divided into 3 different regimes -i) carbide, ii) a transition zone and iii) an oxide one. X-ray diffraction results revealed the occurrence of a face-centered cubic phase (TiC-type) for low oxygen content, also obtained in the TiC 1.6 (O) film, with a clear tendency towards amorphization with the increase of the oxygen flow rate. For the highest oxygen contents, the results revealed the development of a mixture of poorly crystallized TiO 2 phases. The colour results indicated a strong dependence on the O/Ti ratio. A progressive reduction of hardness and residual stresses with the increase of the O/Ti ratio was also observed. The residual stresses, as well as the film structure, seem to play an important role on the adhesion of the coatings. The static friction coefficient revealed also some correlation with the mechanical properties, but mainly with the surface roughness.

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“…In conventional anodisation process, anatase TiO 2 hardly forms on titanium surfaces because the passive amorphous films produced in these processes act as a barrier to prevent further anodisation. Montero 41 showed that an oxide layer could be grown readily on a TiN film, as compared to an anodic oxide film on titanium. The reason for this is that TiN is overstoichiometric with a weak bond existing between Ti and N atoms.…”

Section: Resultsmentioning

confidence: 99%

Effect of single and duplex surface treatments on wear properties of CP-Ti

Alsaran

Albayrak

2011

Surface Engineering

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Wear behaviours of nitrided, anodised and duplex treated commercially pure (CP)-Ti were investigated using a pin on disc tribotester. First, CP-Ti was nitrided and then anodised at different temperatures and times. Phase structure, cross-section and surface hardness of coatings were examined with XRD, SEM and microhardness tester. Formation of TiN and anatase phases were observed after nitriding and anodising respectively. Thickness of the oxide layer along with hardness increased with increasing the anodisation potential and time. A porous structure with circular tube also formed on the surface after anodising. The duplex treatment caused the formation of rutile phase in the oxide layer. It was finally demonstrated that the duplex treatment increased the load bearing capacity due to an increase in the core hardness of CP-Ti which resulted in a reduction of the friction coefficient and wear rate of CP-Ti.

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Effect of substrate bias on sputter-deposited TiCx, TiNy and TiCxNy thin films

Cited by 45 publications

References 15 publications

New approach in the monitoring and characterization of titanium nitride thin films

New approach in the monitoring and characterization of titanium nitride thin films

The influence of structure changes in the properties of TiCxOy decorative thin films

Effect of single and duplex surface treatments on wear properties of CP-Ti

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