Effect of sputtering pressure and power on composition, surface roughness, microstructure and magnetic properties of as-deposited Co2FeSi thin films

Fabrication and Magneto-Structural Properties of Co2-Based Heusler Alloy Glass-Coated Microwires with High Curie Temperature

“…The mentioned irreversibility behavior in magnetic materials at applied low magnetic field is due to the coexistence of typical re-entrant ferromagnetism and spin glass-type behavior, as reported elsewhere [64]. In addition, the disordered structure and chemical composition of Co 2 FeSi G-CMMWs affects the irreversibility behavior where the magnetic ground state is not purely ferromagnetic and random spin disorder (B2 phase) is also found with the ferromagnetic order (L2 1 phase) [63,64]. This behavior is related to the internal stress of glass coating during the fabrication process which induces a disordered structure phase (B2) beside the ordered one (L2 1 ), and amorphous one (as described in the XRD analysis).…”

“…By increasing the temperature in a low static magnetic field, the magnetic moments follow the direction of applied external magnetic field and the magnetization increases if the relaxation phenomena are neglected. Moreover, for further increase of temperature, the relaxation becomes progressively more prominent and, as a result, above a certain temperature, ZFC decreases and finally equals FC [63]. In our current study the ZFC and FC magnetic curve showed large magnetic irreversibility at low magnetic field i.e., H = 50 Oe, with a blocking temperature, T B , of about 205 K, as shown in Figure 4a.…”

Samarium oxide thin films deposited by reactive sputtering: Effects of sputtering power and substrate temperature on microstructure, morphology and electrical properties

“…1(a) and (b). We have observed poor crystallization at 100 W, increased crystallization as the power was increased to 200 W, followed by decrease after 200 W. Increase in the sputtering power may cause an increase in the kinetic energy of the target atoms and, consequently, the energetic target atoms may exhibit higher surface diffusion [27]. Therefore, these atoms are easily adsorbed on the substrate surface resulting in more crystallization.…”

Compositional and electrical properties of Cr, Nb, Cr/Nb, CrNbN, and CrN/NbN multilayers grown using the d.c. magnetron sputtering technique

“…From these images, the roughness value of 2.6 nm and grain size or the order of 10 nm were calculated. According to Srinivas et al surface roughness depends on the gas pressure used during layers growth. Gas pressure inside the chamber and delivered power used in the experiments of the present work were 0.7 Pa and 50 W, respectively; at this condition, ion density of Ar atoms is low, suppressing the interaction and scattering of sputtered species which increases kinetic energy of adatoms that reach the substrate.…”