Effect of sputtering power on the physical properties of dc magnetron sputtered copper oxide thin films

An investigation of the effect of structural order on magnetostriction and magnetic behavior of Fe–Ga alloy thin films

“…Due to the increase in P Fe , the rate of gas-phase nucleation increases, which increases the cluster growth rate of sputtered species and hence increases the grain size in the film. At high P Fe , the charge density increases, which can lead to smaller gasphase cluster formation, causing a decrease in the grain size in the film [41,42]. Furthermore, the deposition rate increases with increase in P Fe , which affects the nucleation and surface diffusion process on the substrate surface [43] due to an increase in energy of the sputtered Fe atoms.…”

Role of Ar/O2 mixture on structural, compositional and optical properties of thin copper oxide films deposited by DC magnetron sputtering

“…A substantial drop in Fig. 6 near the absorption edge is related to the excitation of charge carriers over the optical band gap [11,16].…”

“…It is important to know that the preparation technique can define the electrical and optical properties of the films [4]. Various methods such as evaporation [5][6][7], chemical vapor deposition [8], sputtering [9][10][11][12][13], thermal oxidation [14], sol-gel process [15], were used to produce the copper oxide film. The advantages of sputtering method are its flexibility, scalability, complexity of possible films, reproducibility, ability to work at low temperature, capability to deposit precisely controlled hetero structures, and simplicity of controlling the film composition, structure and morphology.…”

Research on Preparation of Ni/SiO2 Optical Attenuation Slice by Magnetron Sputtering

“…So searching for a new method for the preparation of optical attenuation slice becomes the key to solve problems. Magnetron sputtering [6][7][8] is one of the most promising surfaces coating technology because of its advanced process, high deposition rate, low substrate temperature, good film adhesion and no pollution [9][10][11][12]. Based on this, metal Ni /SiO 2 composite film optical attenuation slice samples were prepared, plating Ni on SiO 2 glass substrates by magnetron sputtering technology.…”