Abstract:In this study, the effect of oxygen content on a thin copper oxide layer deposited on BK7 and steel substrates by DC magnetron sputtering were investigated. Argon as working gas with impurity of 99.9% and various oxygen ratios were used to sputter a pure Cu cathode target in a cylindrical geometry. The produced samples were analyzed by X-ray diffraction (XRD), energy-dispersive X-ray (EDX), atomic force microscopy (AFM), and spectrophotometry techniques. The films thickness was measured by profilometer facilit… Show more
“…The height and the wavelength of the excitonic absorption peaks depends on the concentration and size of NPs respectively while the width of the peak is mostly dependent on their morphology. Of course, these characteristics of NPs may be controlled by laser beam parameters including fluence, wavelength, pulse width, and spot size [29-31]. Figure 4 UV–Vis–NIRspectra (a) absorption of cobalt oxide NPs suspension and (b) reflection of cobalt oxide thin films.…”
In the present work, the effects of deposition time and applied voltage on the quality of cobalt nanoparticle film, deposited on aluminium substrate have been investigated experimentally. Cobalt oxide nanoparticles were produced by laser ablation method. The produced nanoparticles were deposited on aluminium substrate with electrophoretic deposition technique at different applied voltage and deposition time. Produced nanoparticles as well as deposited films were characterized by employing several diagnostics including scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffractometry (XRD), and UV-Vis-NIR spectroscopy. XRD pattern confirmed the presence of the cobalt oxide in all samples. SEM micrographs showed the effective role of applied voltage and deposition time on the morphology of deposited films. By using AFM results roughness, thickness and average particles size of deposited films were measured. Also an optimum point for applied voltage and deposition time were investigated. UV-Vis-NIRspectroscopy determined optical properties of nanoparticles and deposited films.
“…The height and the wavelength of the excitonic absorption peaks depends on the concentration and size of NPs respectively while the width of the peak is mostly dependent on their morphology. Of course, these characteristics of NPs may be controlled by laser beam parameters including fluence, wavelength, pulse width, and spot size [29-31]. Figure 4 UV–Vis–NIRspectra (a) absorption of cobalt oxide NPs suspension and (b) reflection of cobalt oxide thin films.…”
In the present work, the effects of deposition time and applied voltage on the quality of cobalt nanoparticle film, deposited on aluminium substrate have been investigated experimentally. Cobalt oxide nanoparticles were produced by laser ablation method. The produced nanoparticles were deposited on aluminium substrate with electrophoretic deposition technique at different applied voltage and deposition time. Produced nanoparticles as well as deposited films were characterized by employing several diagnostics including scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffractometry (XRD), and UV-Vis-NIR spectroscopy. XRD pattern confirmed the presence of the cobalt oxide in all samples. SEM micrographs showed the effective role of applied voltage and deposition time on the morphology of deposited films. By using AFM results roughness, thickness and average particles size of deposited films were measured. Also an optimum point for applied voltage and deposition time were investigated. UV-Vis-NIRspectroscopy determined optical properties of nanoparticles and deposited films.
“…A lot of different parameters can change the compositions, properties and textures of films deposited by DC sputtering. For instance, the substrate used can impact the nature and crystallinity of the deposit, [62] the composition/concentration of inert gases employed can affect the particles size, [63] the film porosity can be tuned by varying the substrate tilt angle, [64] the chemistry and morphology of the film can be changed by using reactive gases (e. g., O 2 , [65] N 2 [62] ), or again the sputtering rate, sputtering pressure and substrate temperature can strongly impact the surface roughness and grain sizes of the coating. [66] The first parameter investigated in this study is the substrate tilt angle (Θ) (see Figure 1a).…”
All‐solid‐state batteries (ASSB) require stable and safe lithium (Li) metal anode, which needs surface preparation to increase lithium diffusion and impede the formation of dendrites. In this work, the formation of a thin LiZn layer on lithium metal using sputter deposition is reported. This method was selected due to the absence of solvents and by‐products generated during the modification, for its rapidity and because the formation of the alloy is performed in a clean and controlled atmosphere. Zinc has been chosen for its low cost and high Li+ ion diffusion coefficient of the corresponding LiZn alloy that is 1000 times higher than Li. Different parameters for the Zn deposition were investigated such as the distance between the Zn target and Li foil, the effect of substrate tilt and the direct current applied to the target. Electrochemical performance of LiFePO4/solid polymer electrolyte/Li ASSB demonstrated the superiority of the LiZn anodes and the clear influence of deposition parameters on the durability and performance at high C‐rates. Scanning electron microscopy images of the cross‐sectional view of LFP/SPE/Li stackings extracted from pouch cells after cycling showed an evident migration of Zn into the bulk Li metal anode as well as the formation of AlZn nanoparticles.
“…Several researchers studied the effect of oxygen mean pressures and concluded the impact of OMP on the thin-films structural, electrical, and optical properties. The phase composition, crystal structure, and optical behavior of the metal oxide thin-films can be controlled by adjusting the oxygen flow rate in the sputtering process [13][14][15][16].…”
Perovskites are important composites in the area of multidisciplinary applications. It is achieved by carefully choosing and tuning the properties of the thin-film at the deposition. In this paper, ZnTiO3 (ZTO) thinfilms were being deposited on quartz and N-Si substrates by RF magnetron sputtering. The thin-films were developed at room temperature, oxygen percentage levels varying from 0 to 100, and annealed at 600 o C. The electrical, optical, morphological, and structural properties were analyzed as a function of oxygen mixing percentage (OMP). The crystallinity of the cubic structured ZTO thin-film is found to be high at 25 OMP, and it is gradually decreased with increased OMP. The surface morphology of the thin-film is observed, and roughness is measured from the atomic force microscope. Raman Spectroscopy investigated the phase formation and the vibrational modes of the thin-film with their spectral de-convolution. The ZTO thin-films optical properties were investigated using transmittance spectra. The ZTO thin-film indicated the highest refractive index of 2.46, at 633nm with optical bandgap values of 3.57 eV, with a thickness of 145nm and 25 OMP. The refractive index, thin-film thickness, and excitation coefficient were analyzed using the Swanepoel envelope technique. Electrical characteristics of ZTO thin-film are measured from the optimized conditions of the thin-film with conventional thermionic emission (TE) technique.
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