2022
DOI: 10.1016/j.jallcom.2022.164615
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Effect of RF sputtering parameters on the nanoscratch properties of quinary Ti-Zr-Cu-Ni-Al thin film metallic glass

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Cited by 6 publications
(4 citation statements)
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“…The surface morphology of the ZrCuAlNi layers has been investigated by SEM crosssections (see Figure 9), and the results suggest that it is strongly affected by the RF power during the sputtering process. It is well known that sputter-deposited film exhibits characteristic columnar growth [77], and in the SEM cross-section images, the changing morphology of the film with RF power can be clearly observed. In the SEM cross-section image of the amorphous ZrCuAlNi thin-film metallic glass, a columnar nanostructured morphology is observed at 125 W. Interestingly, at 75 W and 100 W, the formation of non-column grains and the presence of small equiaxed grains (<5 nm) are evident.…”
Section: Fe-sem Surface Morphology and Nanostructure Observationmentioning
confidence: 97%
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“…The surface morphology of the ZrCuAlNi layers has been investigated by SEM crosssections (see Figure 9), and the results suggest that it is strongly affected by the RF power during the sputtering process. It is well known that sputter-deposited film exhibits characteristic columnar growth [77], and in the SEM cross-section images, the changing morphology of the film with RF power can be clearly observed. In the SEM cross-section image of the amorphous ZrCuAlNi thin-film metallic glass, a columnar nanostructured morphology is observed at 125 W. Interestingly, at 75 W and 100 W, the formation of non-column grains and the presence of small equiaxed grains (<5 nm) are evident.…”
Section: Fe-sem Surface Morphology and Nanostructure Observationmentioning
confidence: 97%
“…The surface morphology of the ZrCuAlNi layers has been investigated by SEM crosssections (see Figure 9), and the results suggest that it is strongly affected by the RF power during the sputtering process. It is well known that sputter-deposited film exhibits characteristic columnar growth [77], and in the SEM cross-section images, the changing…”
Section: Fe-sem Surface Morphology and Nanostructure Observationmentioning
confidence: 99%
“…In thermal evaporation techniques, ejection of atoms will occur by heating the source to the melting temperature. When an energetic particle, which may be a neutral atom or an ion or a molecule with sufficient energy hit the surface of the target and sputtering occurs [539]. The energy of the hitting particle transfers its energy to the atom on the surface of the target ending in impinging near-surface or surface atoms.…”
Section: Pulsed Laser Depositionmentioning
confidence: 99%
“…And the atoms those overcome the inherent binding energy of the target as a result of multiatom kinetic collision are called sputter atoms and the deposition of these sputter atoms on a surface is known as sputter deposition. The two types sputtering technologies that are widely used are DC sputtering (uses DC power source) and RF sputtering [539] (uses AC power source) [532]. After performing standard cleaning procedures, ScN films were sputter coated on Al 2 O 3 substrates by DC magnetron sputtering mechanism under Ar/N 2 atmosphere with the Sc target and their thermoelectric properties were analyzed [540].…”
Section: Pulsed Laser Depositionmentioning
confidence: 99%