Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering

Influence of deposition temperature on the growth of rutile TiO2 nanostructures by CBD method on seed layer prepared by RF magnetron sputtering

“…Notably, the band at 143 cm −1 is absent in Raman spectra for all samples. These results indicate that the Raman band shift and broadening might be due to oxygen vacancies, significant internal stress, or fine crystals that were caused by fast oxidation and compaction [2].…”

“…Titanium dioxide (TiO 2 ) has been widely studied over the last decades because of its scientific and technological importance [1,2]. TiO 2 thin films have various applications, such as photocatalysis [3][4][5], dye sensitized solar cells [6][7][8], and gas sensors [5,6], because of their remarkable optical and electronic properties.…”

Structural, Dielectric and Optical properties of Sputtered TiO2 nano-films

“…Obviously, the optical transmittance is high in the visible region and increased with the decrease of sputter power from 200 to 80 W respectively [22]. The optical transmittance of the films formed at high sputtering power of 200 W was low due to the formation of substoichiometric TiO 2 films.…”

Simulation and optimization of multilayer-coated microsphere in temperature and refractive index sensing

“…The latter two losses are determined by the quality of coatings. For silica and TiO 2 coatings, RF sputtering methods have been demonstrated [31,37] and the film quality can be improved by adjusting the sputtering pressure, RF power, and the temperature of post annealed. While the coating on the microsphere by RF sputtering has not been reported so far, we cannot obtain the material absorption loss.…”