2014
DOI: 10.1021/jp410167k
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Effect of Pressure and Temperature on Structural Stability of MoS2

Abstract: The crystal structure and spectral properties of bulk MoS 2 were investigated at high pressures up to 51 GPa using a diamond anvil cell with synchrotron radiation in addition to high temperature X-ray diffraction and high pressure Raman spectroscopic analysis. While the crystal structure of MoS 2 is stable on increasing temperature, results of high pressure experiments show a pressure-induced isostructural hexagonal distortion to a 2H a -hexagonal P6 3 /mmc phase around 26 GPa as predicted by theoretical calcu… Show more

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Cited by 119 publications
(116 citation statements)
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“…Our calculated lattice parameters are also in agreement with the experimental data of Bandaru et al in their X-ray diffraction experiments [30]. Also, in Figure 2, it can be seen that as the pressure increases from 0 to 25 GPa, the c/a ratio decreases by 8.08 %.…”
Section: Crystal Structure and Equation Of Statessupporting
confidence: 90%
“…Our calculated lattice parameters are also in agreement with the experimental data of Bandaru et al in their X-ray diffraction experiments [30]. Also, in Figure 2, it can be seen that as the pressure increases from 0 to 25 GPa, the c/a ratio decreases by 8.08 %.…”
Section: Crystal Structure and Equation Of Statessupporting
confidence: 90%
“…1(a)]. Our XRD data show no structural transition at pressures up to 25 GPa, which is consistent with the reported high pressure XRD results [3][4][5]. We performed Rietveld refinement to obtain detailed structural characteristics from the measured high quality XRD patterns [ Fig [3].…”
supporting
confidence: 86%
“…For example, the bulk MoS 2 , an indirect gap semiconductor, shows a pressure-induced metallization and structural phase transition from 2Hc to 2Ha [3][4][5]. When exfoliated to monolayer, the band gap evolves to a direct band gap [6][7][8].…”
mentioning
confidence: 99%
“…18 However, most of the optoelectrical prototypes involving 2D layered TMDs have been obtained via either mechanical exfoliation of 1L-TMDs from bulk crystal 2,11 or using CVD grown single flake. 19,20 To advance technology, establishing scalable processes to fabricate large groups of TMD based devices with homogeneous size and architecture is of utmost interest, not only form the scalability point of view, but also to ensure a low device to-device variability.…”
Section: -16mentioning
confidence: 99%