Effect of Power and Nitrogen Content on the Deposition of CrN Films by Using Pulsed DC Magnetron Sputtering Plasma

Abstract

CrN thin films are deposited on stainless steel (AISI-304) substrate using pulsed DC magnetron sputtering in a mixture of nitrogen and argon plasma. Two set of samples are prepared. The first set of sample is treated at different powers (100 W to 200 W) in a mixture of argon (95%) and nitrogen (5%). The second set of samples is treated at different nitrogen concentrations (5% to 20%) in argon (95% to 80%) for a constant power (150 W). X-ray diffraction (XRD) analysis exhibits the development of new phases related to different compounds. The crystallinity of CrN varies by varying the applied power and nitrogen content. Crystallite size and residual stresses of the CrN (111) plane show similar variation for the applied power and nitrogen contents. Scanning electron microscopy (SEM) analysis shows the formation of a granular surface morphology that varies with the change of powers and nitrogen content. The thickness of the film is measured using SEM cross sectional images and using atomic force microscopy (AFM) scratch analysis. The maximum film thickness (about 755 nm) is obtained for the film deposited at 5% nitrogen in 95% argon at 150 W power. For these conditions, maximum hardness is also observed.

Study of Micro/Nano Structuring and Mechanical Properties of KrF Excimer Laser Irradiated Al for Aerospace Industry and Surface Engineering Applications

“…Lattice defects created by the implanted ions into the lattice and laser-induced thermal shocks can cause residual stress variation. Thermal shocks induced by end of laser pulses generally cause tensile residual stresses, whereas ion implantation results in compressive residual stresses [62]. Compressive residual stress observed for laser fluence of 0.86 J•cm −2 is due to small crystallite size, which offers more boundary area and slows down the slip motion and results in enhanced strength of material by offering the compressive residual stress (enhanced strength can be verified from hardness results).…”

CrN Sputtered Thin Films for Supercapacitor Applications

“…As depicted in Figure 1, the XRD spectrum of sputtered cubic CrN thin films shows three characteristic peaks at 37.45°, 43.35°, and 63.37 corresponding to (111), (200), and (220) planes (JCPDS file no. 110065) [15]. The working electrode also shows three characteristic peaks at 44.54°, 50.56°, and 73.96° corresponding to (111), (200), and (220) planes of cubic phase of 304 L steel substrate (JCPDS file no.…”

Structural Modifications of KrF Excimer Laser-Ablated Zirconium Correlated to the Surface and Mechanical Properties

“…Variations in the value of hardness depend on a number of factors including the lattice defects, density of oxide contents, phase composition, size and distribution of grains and crystal structure [39]. Increase in hardness is attributable to interstitial diffusion of oxygen into the lattice, which results in decrease in crystallite size and tensile residual stresses (Figure 3b) [40]. Smaller crystallite size is efficient in obstructing the dislocation movement and is responsible for high strength and hardness.…”

“…Decrease in value of hardness, of irradiated targets can be explained on the basis of increasing crystallite size and enhanced tensile residual stresses. Oxygen diffusion across the grain boundaries results in larger crystallites (Figure 3b) that are more prone to coarsening, leading to lower crystallite density, and hence lower hardness [40,41]. …”